Works matching DE "TITANIUM nitride films"

Results: 104

Effect of Sputtering Process Parameters on Physical Properties and Electron Emission Level of Titanium Nitride Films.

Published in:

Inorganics, 2025, v. 13, n. 6, p. 201, doi. 10.3390/inorganics13060201

By:

Xia, Yang;
Wang, Dan

Publication type:

Article

Conductive Transparent TiNx/TiO2 Hybrid Films Deposited on Plastics in Air Using Atmospheric Plasma Processing.

Published in:

Advanced Functional Materials, 2014, v. 24, n. 20, p. 3075, doi. 10.1002/adfm.201303038

By:

Dong, Siming;
Watanabe, Makoto;
Dauskardt, Reinhold H.

Publication type:

Article

Evaluation of the Fracture Toughness of Titanium Nitride Hardening Coatings According to Kinetic Indentation and Acoustic Emission Parameters.

Published in:

Measurement Techniques, 2017, v. 60, n. 7, p. 706, doi. 10.1007/s11018-017-1258-4

By:

Kachanov, V.;
Sokolov, I.;
Matyunin, V.;
Barat, V.;
Bardakov, V.;
Marchenkov, A.

Publication type:

Article

切削工具用 Al 高含有 fcc-AlTiN 皮膜の開発と実用化.

Published in:

Journal of the Japan Society of Powder & Powder Metallurgy / Funtai Oyobi Fummatsu Yakin, 2021, v. 68, n. 7, p. 265, doi. 10.2497/jjspm.68.265

By:

石垣卓也;
龍岡翔;
素花章;
西田真

Publication type:

Article

Effect of Cr Concentration on the Optical and Magnetic Properties of Cr‐TiN Thin Films Grown by Reactive Magnetron Sputtering.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2023, v. 220, n. 5, p. 1, doi. 10.1002/pssa.202200544

By:

Abualgassem, Ebrahim;
Maarouf, Monzer;
Bake, Abdulhakim;
Cortie, David;
Alam, Khan;
Haider, Muhammad Baseer

Publication type:

Article

Titanium nitride nano-disk arrays-based metasurface as a perfect absorber in the visible range.

Published in:

Modern Physics Letters B, 2018, v. 32, n. 1, p. -1, doi. 10.1142/S0217984917503651

By:

Liang, Qiuqun;
Fu, Yongqi;
Xia, Xiongping;
Wang, Liu;
Gao, Rummei

Publication type:

Article

The uniformity of TiN films deposited on the inner surfaces of a hemispherical workpiece by high-power pulsed magnetron sputtering.

Published in:

International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2019, v. 33, n. 28, p. N.PAG, doi. 10.1142/S0217979219503296

By:

Liu, H. Y.;
Deng, Q. Y.;
Ma, D. L.;
Li, Y. T.;
Huang, N.;
Leng, Y. X.

Publication type:

Article

Chalcedony beads coated with titanium nitride.

Published in:

Gems & Gemology, 2017, v. 53, n. 2, p. 257

By:

Costa, Emanuele;
Bittarello, Erica;
Navone, Raffaella

Publication type:

Article

Ion beam modification of plasmonic titanium nitride thin films.

Published in:

Journal of Materials Science, 2017, v. 52, n. 11, p. 6442, doi. 10.1007/s10853-017-0879-y

By:

Zhang, Lin-ao;
Liu, Hao-nan;
Suo, Xiao-xia;
Tong, Shou;
Li, Ying-lan;
Jiang, Zhao-tan;
Wang, Zhi

Publication type:

Article

Optimizing the PVD TiN thin film coating's parameters on aerospace AL7075-T6 alloy for higher coating hardness and adhesion with better tribological properties of the coating surface.

Published in:

International Journal of Advanced Manufacturing Technology, 2013, v. 64, n. 1-4, p. 281, doi. 10.1007/s00170-012-4022-6

By:

Zalnezhad, E.;
Sarhan, Ahmed A. D.;
Hamdi, M.

Publication type:

Article

Electrochemical behavior of surface-modified commercially pure titanium in Ringer's solution.

Published in:

Materials Science, 2024, v. 60, n. 2, p. 140, doi. 10.1007/s11003-025-00864-4

By:

Veselivska, H. H.;
Proskurnyak, R. V.;
Kuprin, O. S.;
Myshkovets, N. S.

Publication type:

Article

Cover Feature: Sputtered Titanium Nitride Films on Titanium Foam Substrates as Electrodes for High‐Power Electrochemical Capacitors (ChemElectroChem 16/2018).

Published in:

2018

By:

Zheng, Tianye;
Tahmasebi, Mohammad H.;
Li, Bei;
Li, Ying;
Ran, Sijia;
Glen, Tom S.;
Lam, Kwok‐Ho;
Boles, Steven T.;
Choi, In‐Suk

Publication type:

Cover Art

Sputtered Titanium Nitride Films on Titanium Foam Substrates as Electrodes for High‐Power Electrochemical Capacitors.

Published in:

ChemElectroChem, 2018, v. 5, n. 16, p. 2199, doi. 10.1002/celc.201800467

By:

Zheng, Tianye;
Tahmasebi, Mohammad H.;
Li, Bei;
Li, Ying;
Ran, Sijia;
Glen, Tom S.;
Lam, Kwok‐Ho;
Boles, Steven T.;
Choi, In‐Suk

Publication type:

Article

Tuning the plasmonic resonance in TiN refractory metal.

Published in:

Scientific Reports, 2024, v. 14, n. 1, p. 1, doi. 10.1038/s41598-024-55000-0

By:

Rana, Anchal;
Sharma, Neeraj Kumar;
Bera, Sambhunath;
Yadav, Aditya;
Gupta, Govind;
Rana, Abhimanyu Singh

Publication type:

Article

Organic Optoelectronic Materials (Volume II).

Published in:

Crystals (2073-4352), 2021, v. 11, n. 11, p. 1327, doi. 10.3390/cryst11111327

By:

Tran, Nguyen-Hung;
Nguyen, Van-Chuc;
Lee, Ji-Hoon

Publication type:

Article

X-Ray Photoelectron Spectroscopy Depth Profiling of As-Grown and Annealed Titanium Nitride Thin Films.

Published in:

Crystals (2073-4352), 2021, v. 11, n. 3, p. 239, doi. 10.3390/cryst11030239

By:

Maarouf, Monzer;
Haider, Muhammad Baseer;
Drmosh, Qasem Ahmed;
Mekki, Mogtaba B.;
Cooke, Kavian

Publication type:

Article

Influence of Interlayers on Adhesion Strength of TiN Film on Mg Alloy.

Published in:

Coatings (2079-6412), 2024, v. 14, n. 1, p. 121, doi. 10.3390/coatings14010121

By:

Liu, Huaiyuan;
Li, Jialin;
Ma, Donglin;
Jiang, Xin;
Xie, Dong;
Leng, Yongxiang

Publication type:

Article

The Effect of Match between High Power Impulse and Bias Voltage: TiN Coating Deposited by High Power Impulse Magnetron Sputtering.

Published in:

Coatings (2079-6412), 2021, v. 11, n. 7, p. 822, doi. 10.3390/coatings11070822

By:

Chang, Chi-Lung;
Lin, Ching-Yen;
Yang, Fu-Chi;
Tang, Jian-Fu

Publication type:

Article

Effect of Ion Energy on the Microstructure and Properties of Titanium Nitride Thin Films Deposited by High Power Pulsed Magnetron Sputtering.

Published in:

Coatings (2079-6412), 2021, v. 11, n. 5, p. 579, doi. 10.3390/coatings11050579

By:

Ma, Donglin;
Deng, Qiaoyuan;
Liu, Huaiyuan;
Leng, Yongxiang;
Lamperti, Alessio

Publication type:

Article

Special Issue: Current Research in Thin Film Deposition: Applications, Theory, Processing, and Characterisation.

Published in:

2020

By:

Birney, Ross

Publication type:

Editorial

Influence of C2H2 Flows on Microstructure and Corrosion Resistance of TiCN Films Doped with Carbon Atoms.

Published in:

Coatings (2079-6412), 2018, v. 8, n. 12, p. 458, doi. 10.3390/coatings8120458

By:

Li, Haitao;
Sun, Pengfei;
Zhu, Yongchang;
Wu, Mingzhong;
Wang, Qiang

Publication type:

Article

Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering.

Published in:

Coatings (2079-6412), 2017, v. 7, n. 12, p. 209, doi. 10.3390/coatings7120209

By:

Zaman, Anna;
Meletis, Efstathios I.

Publication type:

Article

High-harmonic generation in metallic titanium nitride.

Published in:

Nature Communications, 2021, v. 12, n. 1, p. 1, doi. 10.1038/s41467-021-25224-z

By:

Korobenko, A.;
Saha, S.;
Godfrey, A. T. K.;
Gertsvolf, M.;
Naumov, A. Yu.;
Villeneuve, D. M.;
Boltasseva, A.;
Shalaev, V. M.;
Corkum, P. B.

Publication type:

Article

CARBON ION IRRADIATION EFFECTS ON PULSED LASER DEPOSITED TITANIUM NITRIDE THIN FILMS.

Published in:

Surface Review & Letters, 2015, v. 22, n. 2, p. -1, doi. 10.1142/S0218625X15500201

By:

MAHMOOD, KHALIQ;
BASHIR, SHAZIA;
AKRAM, MAHREEN;
HAYAT, ASMA;
FAIZAN-Ul-HAQ;
SAADAT, SHAHZAD

Publication type:

Article

EFFECT OF SUBSTRATE TEMPERATURE ON MICRO-STRUCTURAL PROPERTIES OF AND FILMS DEPOSITED BY E-BEAM EVAPORATION TECHNIQUE.

Published in:

Surface Review & Letters, 2012, v. 19, n. 4, p. -1, doi. 10.1142/S0218625X12500370

By:

ARSHI, NISHAT;
LU, JUNQING;
KOO, BON HEUN;
LEE, CHAN GYU;
AHMED, FAHEEM

Publication type:

Article

Optimization of Titanium Nitride Film for High Power RF MEMS Applications.

Published in:

Journal of Electronic Materials, 2019, v. 48, n. 10, p. 6431, doi. 10.1007/s11664-019-07435-9

By:

Kumar, Prem;
Bansal, Deepak;
Anuroop;
Mehta, Khushbu;
Kumar, Amit;
Rangra, Kamaljit;
Boolchandani, Dharmendar

Publication type:

Article

Effect of Nitrogen Content on Physical and Chemical Properties of TiN Thin Films Prepared by DC Magnetron Sputtering with Supported Discharge.

Published in:

Journal of Electronic Materials, 2017, v. 46, n. 10, p. 5773, doi. 10.1007/s11664-017-5608-4

By:

Kavitha, A.;
Kannan, R.;
Gunasekhar, K.;
Rajashabala, S.

Publication type:

Article

Impact of nitrogen reactive gas and substrate temperature on the optical, electrical and structural properties of sputtered TiN thin films.

Published in:

Journal of Materials Science: Materials in Electronics, 2020, v. 31, n. 22, p. 20009, doi. 10.1007/s10854-020-04523-z

By:

Mustapha, N.;
Fekkai, Z.

Publication type:

Article

DC reactively sputtered TiNx thin films for capacitor electrodes.

Published in:

Journal of Materials Science: Materials in Electronics, 2018, v. 29, n. 12, p. 10170, doi. 10.1007/s10854-018-9066-4

By:

Sun, Nana;
Zhou, Dayu;
Zhao, Peng;
Li, Shuaidong;
Wang, Jingjing;
Chu, Shichao;
Ali, Faizan;
Xu, Jin

Publication type:

Article

Influence of substrate and Ar/N2 gas flow ratio on structural, optical and electrical properties of TiN thin films synthetized by DC magnetron sputtering.

Published in:

Journal of Materials Science: Materials in Electronics, 2018, v. 29, n. 12, p. 9893, doi. 10.1007/s10854-018-9031-2

By:

Gu, Peng;
Li, Jitao;
Wu, Haihua;
Yang, Dingyu;
Zhu, Xinghua

Publication type:

Article

The effect of annealing on the structural, optical and electrical properties of Titanium Nitride (TiN) thin films prepared by DC magnetron sputtering with supported discharge.

Published in:

Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 10, p. 10427, doi. 10.1007/s10854-016-5130-0

By:

Kavitha, A.;
Kannan, R.;
Sreedhara Reddy, P.;
Rajashabala, S.

Publication type:

Article

Effects of substrate temperature on the properties of sputtered TiN thin films.

Published in:

Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 3, p. 2800, doi. 10.1007/s10854-015-4093-x

By:

Ghobadi, Nader;
Ganji, Mohsen;
Luna, Carlos;
Arman, Ali;
Ahmadpourian, Azin

Publication type:

Article

The interaction between copper and TiN at low temperature.

Published in:

Journal of Materials Science: Materials in Electronics, 2016, v. 27, n. 2, p. 1679, doi. 10.1007/s10854-015-3940-0

By:

Battegay, Frederic;
Hodaj, Fiqiri

Publication type:

Article

Influence of nitrogen gas flow rate on the structural, morphological and electrical properties of sputtered TiN films.

Published in:

Journal of Materials Science: Materials in Electronics, 2013, v. 24, n. 4, p. 1194, doi. 10.1007/s10854-012-0905-4

By:

Arshi, Nishat;
Lu, Junqing;
Joo, Yun;
Lee, Chan;
Yoon, Jae;
Ahmed, Faheem

Publication type:

Article

Ion-beam assisted sputtering of titanium nitride thin films.

Published in:

Scientific Reports, 2023, v. 13, n. 1, p. 1, doi. 10.1038/s41598-023-31549-0

By:

Draher, Timothy;
Polakovic, Tomas;
Li, Juliang;
Li, Yi;
Welp, Ulrich;
Jiang, Jidong Samuel;
Pearson, John;
Armstrong, Whitney;
Meziani, Zein-Eddine;
Chang, Clarence;
Kwok, Wai-Kwong;
Xiao, Zhili;
Novosad, Valentine

Publication type:

Article

Low temperature plasma-enhanced ALD TiN ultrathin films for Hf0.5Zr0.5O2-based ferroelectric MIM structures.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2017, v. 214, n. 6, p. n/a, doi. 10.1002/pssa.201700056

By:

Kozodaev, M. G.;
Lebedinskii, Y. Y.;
Chernikova, A. G.;
Polyakov, S. N.;
Markeev, A. M.

Publication type:

Article

Layer-by-layer growth of TiN by pulsed laser deposition on in-situ annealed (100) MgO substrates.

Published in:

Physica Status Solidi. A: Applications & Materials Science, 2014, v. 211, n. 11, p. 2621, doi. 10.1002/pssa.201431458

By:

Bonholzer, Michael;
Lorenz, Michael;
Grundmann, Marius

Publication type:

Article

Electrical Characterization of Postmetal Annealed Ultrathin TiN Gate Electrodes in Si MOS Capacitors.

Published in:

Advances in Materials Science & Engineering, 2016, p. 1, doi. 10.1155/2016/3740517

By:

Khan, Z. N.;
Ahmed, S.;
Ali, M.

Publication type:

Article

Kinetic Spraying of Brittle Materials: From Layer Formation to Applications in Aerosol Deposition and Cold Gas Spraying.

Published in:: 2021
Publication type:: Editorial

Influence of nitrogen content on the thermal diffusivity of TiN films prepared by magnetron sputtering.

Published in:

Surface Engineering, 2020, v. 36, n. 2, p. 192, doi. 10.1080/02670844.2019.1646964

By:

Lu, Guiyun;
Yu, Lihua;
Ju, Hongbo;
Zuo, Bin;
Xu, Junhua

Publication type:

Article

Modeling of the Growth Kinetics of Vertically Aligned Carbon Nanotube Arrays on Planar Substrates and an Algorithm for Calculating Rate Coefficients of This Process.

Published in:

Inorganic Materials, 2021, v. 57, n. 1, p. 20, doi. 10.1134/S0020168521010015

By:

Bulyarskiy, S. V.;
Lakalin, A. V.;
Molodenskii, M. S.;
Pavlov, A. A.;
Ryazanov, R. M.

Publication type:

Article

Electrical and optical properties of TiN thin films.

Published in:

Inorganic Materials, 2014, v. 50, n. 1, p. 40, doi. 10.1134/S0020168514010178

By:

Solovan, M.;
Brus, V.;
Maistruk, E.;
Maryanchuk, P.

Publication type:

Article

Nanostructural TiN/Cu coatings deposited from the separated plasma flows.

Published in:

Przegląd Elektrotechniczny, 2016, v. 92, n. 8, p. 173, doi. 10.15199/48.2016.08.47

By:

LATUSHKINA, Svetlana D.;
KUIS, Dmitiy V.;
ZHIZHCHENKO, Alexey G.;
POSYLKINA, Olga I.;
PISKUNOVA, Olga Y.;
OPIELAK, Marek

Publication type:

Article

Nonequilibrium transport near the superconducting transition in TiN films.

Published in:

JETP Letters, 2015, v. 100, n. 10, p. 635, doi. 10.1134/S0021364014220135

By:

Postolova, S.;
Mironov, A.;
Baturina, T.

Publication type:

Article

Controlled Surface Morphology and Electrical Properties of Sputtered Titanium Nitride Thin Film for Metal–Insulator–Metal Structures.

Published in:

Applied Sciences (2076-3417), 2022, v. 12, n. 20, p. N.PAG, doi. 10.3390/app122010415

By:

Dongquoc, Viet;
Seo, Dong-Bum;
Anh, Cao Viet;
Lee, Jae-Hyun;
Park, Jun-Hong;
Kim, Eui-Tae

Publication type:

Article

Influence of substrates on the properties of titanium nitride films deposited by DC reaction magnetron sputtering.

Published in:

Applied Physics A: Materials Science & Processing, 2018, v. 124, n. 8, p. 1, doi. 10.1007/s00339-018-1981-y

By:

Gu, Peng;
Zhu, Xinghua;
Li, Jitao;
Wu, Haihua;
Sun, Hui;
Yang, Dingyu

Publication type:

Article

Wear resistance of ZrC/TiN and ZrC/ZrN thin multilayers grown by pulsed laser deposition.

Published in:

Applied Physics A: Materials Science & Processing, 2013, v. 110, n. 3, p. 717, doi. 10.1007/s00339-012-7224-8

By:

Craciun, D.;
Socol, G.;
Dorcioman, G.;
Niculaie, S.;
Bourne, G.;
Zhang, J.;
Lambers, E.;
Siebein, K.;
Craciun, V.

Publication type:

Article

Reactive sputtering of (Co,Fe) nitride thin films on TiN-bufferd Si.

Published in:

Applied Physics A: Materials Science & Processing, 2013, v. 110, n. 2, p. 487, doi. 10.1007/s00339-012-7251-5

By:

Xiang, H.;
Shi, F.-Y.;
Rzchowski, M.;
Voyles, P.;
Chang, Y.

Publication type:

Article

Uniform Non-stoichiometric Titanium Nitride Thin Films for Improved Kinetic Inductance Detector Arrays.

Published in:

Journal of Low Temperature Physics, 2016, v. 184, n. 3/4, p. 654, doi. 10.1007/s10909-016-1489-9

By:

Coiffard, G.;
Schuster, K.-F.;
Driessen, E.;
Pignard, S.;
Calvo, M.;
Catalano, A.;
Goupy, J.;
Monfardini, A.

Publication type:

Article

Critical Temperature Tuning of Ti/TiN Multilayer Films Suitable for Low Temperature Detectors.

Published in:

Journal of Low Temperature Physics, 2014, v. 176, n. 3/4, p. 155, doi. 10.1007/s10909-013-1078-0

By:

Giachero, A.;
Day, P.;
Falferi, P.;
Faverzani, M.;
Ferri, E.;
Giordano, C.;
Marghesin, B.;
Mattedi, F.;
Mezzena, R.;
Nizzolo, R.;
Nucciotti, A.

Publication type:

Article