Works matching Microlithography

Results: 155

Topology optimization for optical microlithography with partially coherent illumination.

Published in:

International Journal for Numerical Methods in Engineering, 2017, v. 109, n. 5, p. 631, doi. 10.1002/nme.5299

By:

Zhou, Mingdong;
Lazarov, Boyan S.;
Sigmund, Ole

Publication type:

Article

Micrographic Digital Image Correlation Coupled with Microlithography: Case Study of Strain Localization and Subsequent Cracking at an FIB Notch Tip in a Laminated Ti-6Al-4V Alloy.

Published in:

Experimental Mechanics, 2018, v. 58, n. 2, p. 381, doi. 10.1007/s11340-017-0336-5

By:

Koyama, M.;
Tanaka, Y.;
Tsuzaki, K.

Publication type:

Article

Fabrication of oriented crystals as force measurement tips via focused ion beam and microlithography methods.

Published in:

Surface & Interface Analysis: SIA, 2018, v. 50, n. 1, p. 117, doi. 10.1002/sia.6346

By:

Wu, Zhigang;
Chun, Jaehun;
Chatterjee, Sayandev;
Li, Dongsheng

Publication type:

Article

THERMAL ANALYSIS OF A SILICON WAFER PROCESSING COMBINATION BAKE-CHILL STATION USED IN MICROLITHOGRAPHY.

Published in:

Materials & Manufacturing Processes, 2005, v. 20, n. 2, p. 273, doi. 10.1081/AMP-200042048

By:

Narasimhan, Arunn

Publication type:

Article

Artificial colloidal liquid metacrystals by shearing microlithography.

Published in:

Nature Communications, 2019, v. 10, n. 1, p. N.PAG, doi. 10.1038/s41467-019-11941-z

By:

Jiang, Yanqiu;
Guo, Fan;
Xu, Zhen;
Gao, Weiwei;
Gao, Chao

Publication type:

Article

3D Microlithography Using an Integrated System of 5-mm UV-LEDs with a Tilt-Rotational Sample Holder.

Published in:

Micromachines, 2020, v. 11, n. 2, p. 157, doi. 10.3390/mi11020157

By:

Shiba, Sabera Fahmida;
Jeon, Hyeongmin;
Kim, Jong-Soo;
Kim, Jong-Eun;
Kim, Jungkwun

Publication type:

Article

Optical Microlithography of Perovskite Quantum Dots/Organic Semiconductor Heterojunctions for Neuromorphic Photosensors.

Published in:

Advanced Functional Materials, 2024, v. 34, n. 23, p. 1, doi. 10.1002/adfm.202315175

By:

Wu, Yue;
Dai, Shilei;
Liu, Xu;
Guo, Pu;
Zhang, Junyao;
Sun, Tongrui;
Guo, Ziyi;
Xu, Yutong;
Liang, Haixia;
Xiong, Lize;
Hu, Huawei;
Huang, Jia

Publication type:

Article

An alternative approach for microlithography light source.

Published in:

Applied Physics B: Lasers & Optics, 2005, v. 80, n. 4/5, p. 577, doi. 10.1007/s00340-005-1768-7

By:

Bohus, J.;
Szatmári, S.

Publication type:

Article

Evolution in Lithography Techniques: Microlithography to Nanolithography.

Published in:

Nanomaterials (2079-4991), 2022, v. 12, n. 16, p. 2754, doi. 10.3390/nano12162754

By:

Sharma, Ekta;
Rathi, Reena;
Misharwal, Jaya;
Sinhmar, Bhavya;
Kumari, Suman;
Dalal, Jasvir;
Kumar, Anand

Publication type:

Article

Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography.

Published in:

Polymers (20734360), 2020, v. 12, n. 10, p. 2359, doi. 10.3390/polym12102359

By:

Vlnieska, Vitor;
Zakharova, Margarita;
Mikhaylov, Andrey;
Kunka, Danays

Publication type:

Article

High‐Density Ionic Skin via Direct Microlithography of Photosensitive Ionogel.

Published in:

Advanced Functional Materials, 2025, v. 35, n. 4, p. 1, doi. 10.1002/adfm.202414138

By:

Bi, Shuxin;
Si, Haonan;
Gao, Fangfang;
Xun, Xiaochen;
Xu, Liangxu;
Gao, Lusen;
Fan, Liubing;
Zhao, Xuan;
Liao, Qingliang;
Zhang, Yue

Publication type:

Article

STUDY OF THE THERMAL DEPROTECTION IN A CHEMICALLY-AMPLIFIED RESIST.

Published in:

International Journal of Nanoscience, 2004, v. 3, n. 6, p. 775, doi. 10.1142/S0219581X04002632

By:

Lu, D.;
Xing, Z. X.;
Gui, D.;
Kersting, R.

Publication type:

Article

Investigation of Strain Heterogeneities Between Grains in Ferritic and Ferritic-Martensitic Steels.

Published in:

Experimental Mechanics, 2013, v. 53, n. 3, p. 427, doi. 10.1007/s11340-012-9657-6

By:

Marteau, J.;
Haddadi, H.;
Bouvier, S.

Publication type:

Article

Analog Spatial Light Modulators Based on Micromirror Arrays.

Published in:

Micromachines, 2021, v. 12, n. 5, p. 483, doi. 10.3390/mi12050483

By:

Dauderstädt, Ulrike;
Dürr, Peter;
Gehner, Andreas;
Wagner, Michael;
Schenk, Harald;
Hopkins, Jonathan B.;
Panas, Robert M.

Publication type:

Article

Industry's problems, solutions exposed at lithography's annual showcase.

Published in:: Solid State Technology, 2001, v. 44, n. 5, p. 33
Publication type:: Article

50nm gates via optical lithography, OPC advances.

Published in:

Solid State Technology, 2000, v. 43, n. 4, p. 26

By:

Burggraaf, Pieter "Pete"

Publication type:

Article

Birefringence in fused silica and CaF... for lithography.

Published in:

Solid State Technology, 2000, v. 43, n. 2, p. 77

By:

Wang, Baoliang "Bob"

Publication type:

Article

Interface '98 focuses on realistic lithography.

Published in:

Solid State Technology, 1999, v. 42, n. 1, p. 28

By:

M.D.L.

Publication type:

Article

ARO coating passes 1 billion pulse mark at MIT.

Published in:

Solid State Technology, 1998, v. 41, n. 10, p. 44

By:

Burggraaf, Pieter

Publication type:

Article

193-nm development hampered by contamination.

Published in:

Solid State Technology, 1998, v. 41, n. 5, p. 32

By:

Levenson, M. David

Publication type:

Article

CUTTING DIFFRACTION GRATINGS TO IMPROVE DISPERSION ("FIRE") IN DIAMONDS.

Published in:

Gems & Gemology, 2009, v. 45, n. 4, p. 260, doi. 10.5741/GEMS.45.4.260

By:

Gilbertson, Al;
Gudlewski, Benjamin;
Johnson, Mary;
Maltezos, George;
Scherer, Axel;
Shigley, James

Publication type:

Article

Deep learning–based inverse method for layout design.

Published in:

Structural & Multidisciplinary Optimization, 2019, v. 60, n. 2, p. 527, doi. 10.1007/s00158-019-02222-w

By:

Zhang, Yujie;
Ye, Wenjing

Publication type:

Article

New aspects of micromachining and microlithography using 157-nm excimer laser radiation.

Published in:

Applied Physics A: Materials Science & Processing, 1999, v. 69, n. 7, p. S305, doi. 10.1007/s003390051405

By:

Fiebig, M.;
Kauf, M.;
Fair, J.;
Endert, H.;
Rahe, M.;
Basting, D.

Publication type:

Article

Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology (Book Review).

Published in:

1999

By:

Kemhadjian, Henri

Publication type:

Book Review

Microlithography (Book Review).

Published in:

1999

By:

Kemhadjian, Henri

Publication type:

Book Review

Microchip for the Measurement of Seebeck Coefficients of Single Nanowires.

Published in:

Journal of Electronic Materials, 2009, v. 38, n. 7, p. 1109, doi. 10.1007/s11664-009-0714-6

By:

Völklein, F.;
Schmitt, M.;
Cornelius, T.;
Picht, O.;
Müller, S.;
Neumann, R.

Publication type:

Article

High efficiency transmission grating for the ESO CUBES UV spectrograph.

Published in:

Experimental Astronomy, 2023, v. 55, n. 1, p. 281, doi. 10.1007/s10686-022-09840-1

By:

Zeitner, Uwe D.;
Dekker, Hans;
Burmeister, Frank;
Flügel-Paul, Thomas;
Bianco, Andrea;
Zanutta, Alessio

Publication type:

Article

QUANTUM PHENOMENA VISUALIZED BY ELECTRON WAVES.

Published in:

International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics, 2007, v. 21, n. 32, p. 5291, doi. 10.1142/S021797920703837X

By:

TONOMURA, AKIRA

Publication type:

Article

Miniaturization effect of electroosmotic self-propulsive microswimmer powered by biofuel cell.

Published in:

ROBOMECH Journal, 2019, v. 6, n. 1, p. 1, doi. 10.1186/s40648-019-0146-x

By:

Yamanaka, Toshiro;
Arai, Fumihito

Publication type:

Article

Design of an ultraviolet projection lens by using a global search algorithm and computer optimization.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 1, p. 31, doi. 10.1515/aot-2016-0058

By:

Zoric, Nenad;
Livshits, Irina;
Dilworth, Don;
Okishev, Sergey

Publication type:

Article

FABRICATION OF TRUE-COLOR MICROPATTERNS BY 2D STEPWISE CONTRACTION AND ADSORPTION NANOLITHOGRAPHY (SCAN).

Published in:

Surface Review & Letters, 2007, v. 14, n. 1, p. 129, doi. 10.1142/S0218625X07009141

By:

HAI LI;
XIAO-DONG ZHANG;
YI ZHANG;
ZHEN-QIAN OUYANG;
HU, JUN

Publication type:

Article

Deformation of Aluminum Investigated by Digital Image Correlation: Evidence of Simultaneous Crystal Slip and Grain Boundary Sliding.

Published in:

Metallurgical & Materials Transactions. Part A, 2024, v. 55, n. 6, p. 1814, doi. 10.1007/s11661-024-07349-0

By:

Dimanov, A.;
El Sabbagh, A.;
Raphanel, J.;
Bornert, M.;
Thien-Nga, L.;
Hallais, S.;
Tanguy, A.

Publication type:

Article

Elimination, reversal and directional bias of optical diffraction.

Published in:

Nature Physics, 2009, v. 5, n. 9, p. 665, doi. 10.1038/nphys1358

By:

Firstenberg, Ofer;
London, Paz;
Shuker, Moshe;
Ron, Amiram;
Davidson, Nir

Publication type:

Article

Generating broadband random Gaussian signals.

Published in:

Technical Physics Letters, 2010, v. 36, n. 8, p. 733, doi. 10.1134/S106378501008016X

By:

Zhilyaev, Yu. V.;
Il'inskaya, N. D.;
Inovenkov, A. N.;
Karpov, A. A.;
Kuznetsov, S. I.;
Orlova, T. A.;
Panteleev, V. N.;
Panyutin, E. A.;
Snytkina, S. A.;
Titkova, O. V.;
Fedorov, L. M.;
Khvostikov, V. P.

Publication type:

Article

Far-field Diffraction Properties of Annular Walsh Filters.

Published in:

Advances in Optical Technologies, 2013, p. 1, doi. 10.1155/2013/360450

By:

Mukherjee, Pubali;
Hazra, Lakshminarayan

Publication type:

Article

Bis zu mehreren Millionen Spiegeln auf einem Halbleiterchip.

Published in:: Elektronik Industrie, 2023, p. 75
Publication type:: Article

A Novel Approach to Align Adult Neural Stem Cells on Micropatterned Conduits for Peripheral Nerve Regeneration: A Feasibility Study.

Published in:

Artificial Organs, 2009, v. 33, n. 1, p. 26, doi. 10.1111/j.1525-1594.2008.00671.x

By:

Hsu, Shan-hui;
Su, Chien-Hsiang;
Chiu, Ing-Ming

Publication type:

Article

High-efficiency clean EUV plasma source at 10–30 nm, driven by a long-pulse-width excimer laser.

Published in:

Applied Physics B: Lasers & Optics, 2003, v. 76, n. 3, p. 277, doi. 10.1007/s00340-002-1088-0

By:

Bollanti, S.;
Bonfigli, F.;
Burattini, E.;
Di Lazzaro, P.;
Flora, F.;
Grilli, A.;
Letardi, T.;
Lisi, N.;
Marinai, A.;
Mezi, L.;
Murra, D.;
Zheng, C.

Publication type:

Article

Cytophobic Surface Modification of Microfluidic Arrays for In Situ Parallel Peptide Synthesis and Cell Adhesion Assays.

Published in:

Biotechnology Progress, 2007, v. 23, n. 4, p. 972, doi. 10.1002/bp070070a

By:

Suparna Mandal;
Jean Marie Rouillard;
Onnop Srivannavit;
Erdogan Gulari

Publication type:

Article

Maskless Lithographic Pattern Generation System upon Micromirrors.

Published in:

Computer-Aided Design & Applications, 2006, v. 3, n. 1-4, p. 185, doi. 10.1080/16864360.2006.10738455

By:

Manseung Seo;
Haeryung Kim;
Myungjoo Park

Publication type:

Article

Extension of Pocket Machining to Direct Write Lithography.

Published in:

Computer-Aided Design & Applications, 2006, v. 3, n. 1-4, p. 155, doi. 10.1080/16864360.2006.10738452

By:

Manseung Seo;
Haeryung Kim

Publication type:

Article

Next-generation litho is the focus of Belgium conference.

Published in:

Solid State Technology, 1999, v. 42, n. 1, p. 20

By:

M.D.L

Publication type:

Article

Tech briefs.

Published in:: Solid State Technology, 1998, v. 41, n. 5, p. 32
Publication type:: Article

Studies of dissolution phenomena in microlithography.

Published in:

Polymer Engineering & Science, 1987, v. 27, n. 4, p. 282, doi. 10.1002/pen.760270408

By:

Krasicky, P. D.;
Groele, R. J.;
Jubinsky, J. A.;
Rodriguez, F.;
Namaste, Y. M. N.;
Obendorf, S. K.

Publication type:

Article

Azide-phenolic resin UV resist (MRL) for microlithography.

Published in:

Polymer Engineering & Science, 1983, v. 23, n. 17, p. 935, doi. 10.1002/pen.760231704

By:

Iwayanagi, Takao;
Hashimoto, Michiaki;
Nonogaki, Saburo;
Koibuchi, Shigeru;
Makino, Daisuke

Publication type:

Article

Novel Design of Carbon-Rich Polymers for 193 nm Microlithography: Adamantane-Containing Cyclopolymers.

Published in:

Advanced Materials, 2000, v. 12, n. 5, p. 347, doi. 10.1002/(SICI)1521-4095(200003)12:5<347::AID-ADMA347>3.0.CO;2-D

By:

Pasini, D.;
Low, E.;
Fréchet, J. M. J.

Publication type:

Article

High-resolution lithography based on selective removal of atoms.

Published in:

Crystallography Reports, 2006, v. 51, p. S196, doi. 10.1134/S1063774506070285

By:

Domantovskiĭ, A. G.;
Gurovich, B. A.;
Maslakov, K. I.

Publication type:

Article

Early geometric microlith technology in Central Asia.

Published in:

Archaeological & Anthropological Sciences, 2019, v. 11, n. 4, p. 1407, doi. 10.1007/s12520-018-0613-y

By:

Kolobova, K.;
Krivoshapkin, A.;
Shnaider, S.

Publication type:

Article

Linewidth control by overexposure in laser lithography.

Published in:

Optica Applicata, 2008, v. 38, n. 2, p. 399

By:

LIANG YIYONG;
YANG GUOGUANG

Publication type:

Article

L. F. Thompson, C. G. Willson, M. J. Bowden (ed.). Introduction to Microlithography Second Edition. American Chemical Society, Washington, DC 1994, 527 Seiten, US $ 59,95 IBBN 8-8412-2848-5.

Published in:

Crystal Research & Technology, 1995, v. 30, n. 4, p. 508, doi. 10.1002/crat.2170300415

By:

Süptitz, P.

Publication type:

Article