Works matching IS 24335835 AND DT 2024 AND VI 67 AND IP 2
Results: 10
Introduction of the American Vacuum Society ?Science and Technology of Materials, Interfaces and Processing (AVS).
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 86, doi. 10.1380/vss.67.86
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Introduction of Taiwan Association for Coating and Thin Film Technology.
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 44, doi. 10.1380/vss.67.84
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Technical Development Award by JVSS.
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 43
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High-speed Synthesis and Functionalization of Nanographene by In-liquid Plasma.
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 71, doi. 10.1380/vss.67.77
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Preparation of Various Functional Thin Films by Sputtering Deposition Using Powder Target.
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 71, doi. 10.1380/vss.67.71
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Plasmonic Plasma Deposition Using Nanostructured Materials on Si Substrates.
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 65, doi. 10.1380/vss.67.65
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Precise Deposition and Application of Diamond-like Carbon by Photo-excited Plasma.
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 59, doi. 10.1380/vss.67.59
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Applied Research on Si-containing Diamond-like Carbon Films and Fundamental Research on Si Incorporation into the Films.
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 52
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Thin-film Silicon Growth by Plasma-enhanced CVD : Gas-phase, Surface and In-film Reactions for High-quality Film Formation.
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 44, doi. 10.1380/vss.67.44
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Film Deposition by Controlling Plasma-induced Surface Reactions.
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- Vacuum & Surface Science, 2024, v. 67, n. 2, p. 1, doi. 10.1380/vss.67.42
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