Works matching IS 2199160X AND DT 2022 AND VI 8 AND IP 5


Results: 37
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    Excessive Oxygen Peroxide Model‐Based Analysis of Positive‐Bias‐Stress and Negative‐Bias‐Illumination‐Stress Instabilities in Self‐Aligned Top‐Gate Coplanar In–Ga–Zn–O Thin‐Film Transistors (Adv. Electron. Mater. 5/2022)

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202101062
    By:
    • Choi, Sungju;
    • Park, Jingyu;
    • Hwang, Seong‐Hyun;
    • Kim, Changwook;
    • Kim, Yong‐Sung;
    • Oh, Saeroonter;
    • Baeck, Ju Heyuck;
    • Bae, Jong Uk;
    • Noh, Jiyong;
    • Lee, Seok‐Woo;
    • Park, Kwon‐Shik;
    • Kim, Jeom‐Jae;
    • Yoon, Soo Young;
    • Kwon, Hyuck‐In;
    • Kim, Dae Hwan
    Publication type:
    Article
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    Reconfigurable InSe Electronics with van der Waals Integration.

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202101176
    By:
    • Hu, Siqi;
    • Luo, Xiaoguang;
    • Xu, Jinpeng;
    • Zhao, Qinghua;
    • Cheng, Yingchun;
    • Wang, Tao;
    • Jie, Wanqi;
    • Castellanos‐Gomez, Andres;
    • Gan, Xuetao;
    • Zhao, Jianlin
    Publication type:
    Article
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    Polymer‐Based Composites for Engineering Organic Memristive Devices.

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202101192
    By:
    • Prado‐Socorro, Carlos David;
    • Giménez‐Santamarina, Silvia;
    • Mardegan, Lorenzo;
    • Escalera‐Moreno, Luis;
    • Bolink, Henk J.;
    • Cardona‐Serra, Salvador;
    • Coronado, Eugenio
    Publication type:
    Article
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    Excessive Oxygen Peroxide Model‐Based Analysis of Positive‐Bias‐Stress and Negative‐Bias‐Illumination‐Stress Instabilities in Self‐Aligned Top‐Gate Coplanar In–Ga–Zn–O Thin‐Film Transistors

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202101062
    By:
    • Choi, Sungju;
    • Park, Jingyu;
    • Hwang, Seong‐Hyun;
    • Kim, Changwook;
    • Kim, Yong‐Sung;
    • Oh, Saeroonter;
    • Baeck, Ju Heyuck;
    • Bae, Jong Uk;
    • Noh, Jiyong;
    • Lee, Seok‐Woo;
    • Park, Kwon‐Shik;
    • Kim, Jeom‐Jae;
    • Yoon, Soo Young;
    • Kwon, Hyuck‐In;
    • Kim, Dae Hwan
    Publication type:
    Article
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    Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films.

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202100837
    By:
    • Ali, Tarek;
    • Lehninger, David;
    • Lederer, Maximilian;
    • Li, Songrui;
    • Kühnel, Kati;
    • Mart, Clemens;
    • Mertens, Konstantin;
    • Hoffmann, Raik;
    • Olivo, Ricardo;
    • Emara, Jennifer;
    • Biedermann, Kati;
    • Metzger, Joachim;
    • Binder, Robert;
    • Czernohorsky, Malte;
    • Kämpfe, Thomas;
    • Müller, Johannes;
    • Seidel, Konrad;
    • Eng, Lukas M.
    Publication type:
    Article
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