Works matching IS 2199160X AND DT 2022 AND VI 8 AND IP 5


Results: 37
    1
    2

    Excessive Oxygen Peroxide Model‐Based Analysis of Positive‐Bias‐Stress and Negative‐Bias‐Illumination‐Stress Instabilities in Self‐Aligned Top‐Gate Coplanar In–Ga–Zn–O Thin‐Film Transistors (Adv. Electron. Mater. 5/2022)

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202101062
    By:
    • Choi, Sungju;
    • Park, Jingyu;
    • Hwang, Seong‐Hyun;
    • Kim, Changwook;
    • Kim, Yong‐Sung;
    • Oh, Saeroonter;
    • Baeck, Ju Heyuck;
    • Bae, Jong Uk;
    • Noh, Jiyong;
    • Lee, Seok‐Woo;
    • Park, Kwon‐Shik;
    • Kim, Jeom‐Jae;
    • Yoon, Soo Young;
    • Kwon, Hyuck‐In;
    • Kim, Dae Hwan
    Publication type:
    Article
    3
    4
    5
    6
    7
    8
    9
    10

    Polymer‐Based Composites for Engineering Organic Memristive Devices.

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202101192
    By:
    • Prado‐Socorro, Carlos David;
    • Giménez‐Santamarina, Silvia;
    • Mardegan, Lorenzo;
    • Escalera‐Moreno, Luis;
    • Bolink, Henk J.;
    • Cardona‐Serra, Salvador;
    • Coronado, Eugenio
    Publication type:
    Article
    11
    12

    Reconfigurable InSe Electronics with van der Waals Integration.

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202101176
    By:
    • Hu, Siqi;
    • Luo, Xiaoguang;
    • Xu, Jinpeng;
    • Zhao, Qinghua;
    • Cheng, Yingchun;
    • Wang, Tao;
    • Jie, Wanqi;
    • Castellanos‐Gomez, Andres;
    • Gan, Xuetao;
    • Zhao, Jianlin
    Publication type:
    Article
    13
    14
    15
    16
    17
    18
    19
    20

    Excessive Oxygen Peroxide Model‐Based Analysis of Positive‐Bias‐Stress and Negative‐Bias‐Illumination‐Stress Instabilities in Self‐Aligned Top‐Gate Coplanar In–Ga–Zn–O Thin‐Film Transistors

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202101062
    By:
    • Choi, Sungju;
    • Park, Jingyu;
    • Hwang, Seong‐Hyun;
    • Kim, Changwook;
    • Kim, Yong‐Sung;
    • Oh, Saeroonter;
    • Baeck, Ju Heyuck;
    • Bae, Jong Uk;
    • Noh, Jiyong;
    • Lee, Seok‐Woo;
    • Park, Kwon‐Shik;
    • Kim, Jeom‐Jae;
    • Yoon, Soo Young;
    • Kwon, Hyuck‐In;
    • Kim, Dae Hwan
    Publication type:
    Article
    21
    22
    23
    24
    25
    26
    27
    28
    29
    30
    31
    32
    33
    34
    35
    36

    Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films.

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 5, p. 1, doi. 10.1002/aelm.202100837
    By:
    • Ali, Tarek;
    • Lehninger, David;
    • Lederer, Maximilian;
    • Li, Songrui;
    • Kühnel, Kati;
    • Mart, Clemens;
    • Mertens, Konstantin;
    • Hoffmann, Raik;
    • Olivo, Ricardo;
    • Emara, Jennifer;
    • Biedermann, Kati;
    • Metzger, Joachim;
    • Binder, Robert;
    • Czernohorsky, Malte;
    • Kämpfe, Thomas;
    • Müller, Johannes;
    • Seidel, Konrad;
    • Eng, Lukas M.
    Publication type:
    Article
    37