Works matching IS 2199160X AND DT 2022 AND VI 8 AND IP 11


Results: 53
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    Oxygen‐Scavenging Effects of Added Ti Layer in the TiN Gate of Metal‐Ferroelectric‐Insulator‐Semiconductor Capacitor with Al‐Doped HfO<sub>2</sub> Ferroelectric Film (Adv. Electron. Mater. 11/2022).

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 11, p. 1, doi. 10.1002/aelm.202200310
    By:
    • Lee, Yong Bin;
    • Kim, Beom Yong;
    • Park, Hyeon Woo;
    • Lee, Suk Hyun;
    • Oh, Minsik;
    • Ryoo, Seung Kyu;
    • Lee, In Soo;
    • Byun, Seungyong;
    • Shim, Doosup;
    • Lee, Jae Hoon;
    • Kim, Hani;
    • Kim, Kyung Do;
    • Park, Min Hyuk;
    • Hwang, Cheol Seong
    Publication type:
    Article
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    Oxygen‐Scavenging Effects of Added Ti Layer in the TiN Gate of Metal‐Ferroelectric‐Insulator‐Semiconductor Capacitor with Al‐Doped HfO<sub>2</sub> Ferroelectric Film (Adv. Electron. Mater. 11/2022)

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 11, p. 1, doi. 10.1002/aelm.202200310
    By:
    • Lee, Yong Bin;
    • Kim, Beom Yong;
    • Park, Hyeon Woo;
    • Lee, Suk Hyun;
    • Oh, Minsik;
    • Ryoo, Seung Kyu;
    • Lee, In Soo;
    • Byun, Seungyong;
    • Shim, Doosup;
    • Lee, Jae Hoon;
    • Kim, Hani;
    • Kim, Kyung Do;
    • Park, Min Hyuk;
    • Hwang, Cheol Seong
    Publication type:
    Article
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    Thermal Enhanced Resistive Switching Performance of <100>‐oriented Perovskite [(TZ‐H)<sub>2</sub>(PbBr<sub>4</sub>)]<sub>n</sub> with High Working Temperature: a Triazolium/(PbBr<sub>4</sub>)<sub>n</sub><sup>2</sup><sup>n</sup><sup>–</sup> Interfacial Interaction Insight

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 11, p. 1, doi. 10.1002/aelm.202200537
    By:
    • Song, Kaiyue;
    • Chen, Binjun;
    • Lin, Xiaoli;
    • Yang, Hailong;
    • Liu, Yue;
    • Liu, Yuanzheng;
    • Li, Haohong;
    • Chen, Zhirong
    Publication type:
    Article
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    Transport Spectroscopy of Ultraclean Tunable Band Gaps in Bilayer Graphene.

    Published in:
    Advanced Electronic Materials, 2022, v. 8, n. 11, p. 1, doi. 10.1002/aelm.202200510
    By:
    • Icking, Eike;
    • Banszerus, Luca;
    • Wörtche, Frederike;
    • Volmer, Frank;
    • Schmidt, Philipp;
    • Steiner, Corinne;
    • Engels, Stephan;
    • Hesselmann, Jonas;
    • Goldsche, Matthias;
    • Watanabe, Kenji;
    • Taniguchi, Takashi;
    • Volk, Christian;
    • Beschoten, Bernd;
    • Stampfer, Christoph
    Publication type:
    Article
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