Works matching IS 21928576 AND DT 2017 AND VI 6 AND IP 3/4

Results: 16

Chip bonding of low-melting eutectic alloys by transmitted laser radiation.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 311, doi. 10.1515/aot-2017-0011

By:

Hoff, Christian;
Venkatesh, Arjun;
Schneider, Friedrich;
Hermsdorf, Jörg;
Bengsch, Sebastian;
Wurz, Marc C.;
Kaierle, Stefan;
Overmeyer, Ludger

Publication type:

Article

Challenges of anamorphic high-NA lithography and mask making.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 293, doi. 10.1515/aot-2017-0024

By:

Hsu, Stephen D.;
Jingjing Liu

Publication type:

Article

A full-process chain assessment for nanoimprint technology on 200-mm industrial platform.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 277, doi. 10.1515/aot-2017-0018

By:

Teyssedre, Hubert;
Landis, Stefan;
Thanner, Christine;
Laure, Maria;
Khan, Jonas;
Bos, Sandra;
Eibelhuber, Martin;
Chouiki, Mustapha;
May, Michael;
Brianceau, Pierre;
Pollet, Olivier;
Hazart, Jerome;
Laviron, Cyrille;
Pain, Laurent;
Wimplinger, Markus

Publication type:

Article

Laser interference patterning methods: Possibilities for high-throughput fabrication of periodic surface patterns.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 265, doi. 10.1515/aot-2017-0016

By:

Fabián Lasagni, Andrés

Publication type:

Article

Large area nanoimprint by substrate conformal imprint lithography (SCIL).

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 243, doi. 10.1515/aot-2017-0022

By:

Verschuuren, Marc A.;
Megens, Mischa;
Yongfeng Ni;
van Sprang, Hans;
Polman, Albert

Publication type:

Article

A review of nanoimprint lithography for high-volume semiconductor device manufacturing.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 229, doi. 10.1515/aot-2017-0020

By:

Resnick, Douglas J.;
Jin Choi

Publication type:

Article

Development and performance of EUV pellicles.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 221, doi. 10.1515/aot-2017-0023

By:

Brouns, Derk

Publication type:

Article

EUV mask defectivity – a process of increasing control toward HVM.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 203, doi. 10.1515/aot-2017-0017

By:

Jonckheere, Rik

Publication type:

Article

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 187, doi. 10.1515/aot-2017-0019

By:

Erdmann, Andreas;
Dongbo Xu;
Evanschitzky, Peter;
Philipsen, Vicky;
Vu Luong;
Hendrickx, Eric

Publication type:

Article

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 173, doi. 10.1515/aot-2017-0029

By:

Fomenkov, Igor;
Brandt, David;
Ershov, Alex;
Schafgans, Alexander;
Yezheng Tao;
Vaschenko, Georgiy;
Rokitski, Slava;
Kats, Michael;
Vargas, Michael;
Purvis, Michael;
Rafac, Rob;
La Fontaine, Bruno;
De Dea, Silvia;
LaForge, Andrew;
Stewart, Jayson;
Chang, Steven;
Graham, Matthew;
Riggs, Daniel;
Taylor, Ted;
Abraham, Mathew

Publication type:

Article

Photoresists in extreme ultraviolet lithography (EUVL).

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 163, doi. 10.1515/aot-2017-0021

By:

De Simone, Danilo;
Vesters, Yannick;
Vandenberghe, Geert

Publication type:

Article

Next-generation lithography – an outlook on EUV projection and nanoimprint.

Published in:

2017

By:

van Schoot, Jan;
Schift, Helmut

Publication type:

Editorial

News from the European Optical Society (EOS).

Published in:: 2017
Publication type:: Calendar

Conference Calendar.

Published in:: 2017
Publication type:: Calendar

Conference Notes.

Published in:: 2017
Publication type:: Calendar

Patterning roadmap: 2017 prospects.

Published in:

Advanced Optical Technologies, 2017, v. 6, n. 3/4, p. 143, doi. 10.1515/aot-2017-0039

By:

Neisser, Mark

Publication type:

Article