Works matching IS 21928576 AND DT 2012 AND VI 1 AND IP 4

Results: 14

Calculation and uses of the lithographic aerial image.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 237, doi. 10.1515/aot-2012-0028

By:

Flagello, Donis G.;
Smith, Daniel G.

Publication type:

Article

Development of core technologies on EUV mask and resist for sub-20-nm half pitch generation.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 269, doi. 10.1515/aot-2012-0029

By:

Inoue, Soichi;
Amano, Tsuyoshi;
Itani, Toshiro;
Watanabe, Hidehiro;
Mori, Ichiro;
Watanabe, Takeo;
Kinoshita, Hiroo;
Miyai, Hiroki;
Hatakeyama, Masahiro

Publication type:

Article

Practical aspects of modern interferometry for optical manufacturing quality control, Part 3.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 335, doi. 10.1515/aot-2012-0031

By:

Smythe, Robert A.

Publication type:

Article

Imaging optics on scanner for SMO generation process.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 323, doi. 10.1515/aot-2012-0032

By:

Matsuyama, Tomoyuki;
Mizuno, Yasushi;
Smith, Daniel G.

Publication type:

Article

Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 249, doi. 10.1515/aot-2012-0037

By:

Lai, Kafai

Publication type:

Article

Conference Calendar.

Published in:: Advanced Optical Technologies, 2012, v. 1, n. 4, p. 235, doi. 10.1515/aot-2012-0042
Publication type:: Article

News from The European Optical Society.

Published in:: Advanced Optical Technologies, 2012, v. 1, n. 4, p. 223, doi. 10.1515/aot-2012-0043
Publication type:: Article

The Next Decade of Optical Lithography.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 215, doi. 10.1515/aot-2012-0044

By:

Totzeck, Michael;
Lai, Kafai;
Smith, Daniel

Publication type:

Article

ITRS lithography roadmap: status and challenges.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 217, doi. 10.1515/aot-2012-0045

By:

Neisser, Mark;
Wurm, Stefan

Publication type:

Article

Conference Notes.

Published in:: Advanced Optical Technologies, 2012, v. 1, n. 4, p. 227, doi. 10.1515/aot-2012-0046
Publication type:: Article

Aerial imaging technology for photomask qualification: from a microscope to a metrology tool.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 289, doi. 10.1515/aot-2012-0124

By:

Garetto, Anthony;
Scherübl, Thomas;
Peters, Jan Hendrik

Publication type:

Article

Advances in EUV light sources.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 279, doi. 10.1515/aot-2012-0125

By:

Farrar, Nigel R.;
La Fontaine, Bruno M.;
Fomenkov, Igor V.;
Brandt, David C.

Publication type:

Article

Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair.

Published in:

Advanced Optical Technologies, 2012, v. 1, n. 4, p. 299, doi. 10.1515/aot-2012-0127

By:

Pang, Linyong;
Peng, Danping;
Hu, Peter;
Chen, Dongxue;
He, Lin;
Li, Ying;
Satake, Masaki;
Tolani, Vikram

Publication type:

Article

Masthead.

Published in:: Advanced Optical Technologies, 2012, v. 1, n. 4, p. i, doi. 10.1515/aot-2012-masthead4
Publication type:: Article