Works matching IS 21928576 AND DT 2012 AND VI 1 AND IP 4
Results: 14
Calculation and uses of the lithographic aerial image.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 237, doi. 10.1515/aot-2012-0028
- By:
- Publication type:
- Article
Development of core technologies on EUV mask and resist for sub-20-nm half pitch generation.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 269, doi. 10.1515/aot-2012-0029
- By:
- Publication type:
- Article
Practical aspects of modern interferometry for optical manufacturing quality control, Part 3.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 335, doi. 10.1515/aot-2012-0031
- By:
- Publication type:
- Article
Imaging optics on scanner for SMO generation process.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 323, doi. 10.1515/aot-2012-0032
- By:
- Publication type:
- Article
Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 249, doi. 10.1515/aot-2012-0037
- By:
- Publication type:
- Article
Conference Calendar.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 235, doi. 10.1515/aot-2012-0042
- Publication type:
- Article
News from The European Optical Society.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 223, doi. 10.1515/aot-2012-0043
- Publication type:
- Article
The Next Decade of Optical Lithography.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 215, doi. 10.1515/aot-2012-0044
- By:
- Publication type:
- Article
ITRS lithography roadmap: status and challenges.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 217, doi. 10.1515/aot-2012-0045
- By:
- Publication type:
- Article
Conference Notes.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 227, doi. 10.1515/aot-2012-0046
- Publication type:
- Article
Aerial imaging technology for photomask qualification: from a microscope to a metrology tool.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 289, doi. 10.1515/aot-2012-0124
- By:
- Publication type:
- Article
Advances in EUV light sources.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 279, doi. 10.1515/aot-2012-0125
- By:
- Publication type:
- Article
Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. 299, doi. 10.1515/aot-2012-0127
- By:
- Publication type:
- Article
Masthead.
- Published in:
- Advanced Optical Technologies, 2012, v. 1, n. 4, p. i, doi. 10.1515/aot-2012-masthead4
- Publication type:
- Article