Works matching IS 21926506 AND DT 2014 AND VI 79 AND IP 4
1
- ChemPlusChem, 2014, v. 79, n. 4, p. 536, doi. 10.1002/cplu.201300428
- Beppu, Teruo;
- Kawata, So;
- Aizawa, Naoya;
- Pu, Yong‐Jin;
- Abe, Yasuyuki;
- Ohba, Yoshihiro;
- Katagiri, Hiroshi
- Article
2
- ChemPlusChem, 2014, v. 79, n. 4, p. 564, doi. 10.1002/cplu.201300354
- Cavalli, Silvia;
- Overhand, Mark;
- Kros, Alexander
- Article
4
- ChemPlusChem, 2014, v. 79, n. 4, p. 508, doi. 10.1002/cplu.201400014
- Zhong, Hai‐Jing;
- Leung, Ka‐Ho;
- Liu, Li‐Juan;
- Lu, Lihua;
- Chan, Daniel Shiu‐Hin;
- Leung, Chung‐Hang;
- Ma, Dik‐Lung
- Article
5
- ChemPlusChem, 2014, v. 79, n. 4, p. 592, doi. 10.1002/cplu.201300426
- Horváth, Endre;
- Grebikova, Lucie;
- Maroni, Plinio;
- Szabó, Tamás;
- Magrez, Arnaud;
- Forró, László;
- Szilagyi, Istvan
- Article
6
- ChemPlusChem, 2014, v. 79, n. 4, p. 546, doi. 10.1002/cplu.201400013
- Anju, V. P.;
- Barik, Subrat Kumar;
- Mondal, Bijnaneswar;
- Ramkumar, V.;
- Ghosh, Sundargopal
- Article
7
- ChemPlusChem, 2014, v. 79, n. 4, p. 584, doi. 10.1002/cplu.201400006
- Fraschetti, Caterina;
- Filippi, Antonello;
- Borocci, Stefano;
- Steinmetz, Vincent;
- Speranza, Maurizio
- Article
8
- ChemPlusChem, 2014, v. 79, n. 4, p. 516, doi. 10.1002/cplu.201300400
- Miura, Ryosuke;
- Ando, Yasunari;
- Hotta, Yasuhisa;
- Nagatani, Yoshiki;
- Tsuda, Akihiko
- Article
9
- ChemPlusChem, 2014, v. 79, n. 4, p. 559, doi. 10.1002/cplu.201300415
- Zhang, Yuliang;
- Xia, Ting;
- Yu, Kin Man;
- Zhang, Fuhua;
- Yang, Heng;
- Liu, Boyang;
- An, Yan;
- Yin, Yansheng;
- Chen, Xiaobo
- Article
10
- ChemPlusChem, 2014, v. 79, n. 4, p. 473, doi. 10.1002/cplu.201490010
- Article
11
- ChemPlusChem, 2014, v. 79, n. 4, p. 610, doi. 10.1002/cplu.201300425
- Gupta, Gajendra;
- Mahesh Kumar, Jerald;
- Garci, Amine;
- Rangaraj, Nandini;
- Nagesh, Narayana;
- Therrien, Bruno
- Article
12
- ChemPlusChem, 2014, v. 79, n. 4, p. 484, doi. 10.1002/cplu.201490012
- Article
13
- ChemPlusChem, 2014, v. 79, n. 4, p. 601, doi. 10.1002/cplu.201300373
- Dong, Guoping;
- He, Huilin;
- Pan, Qiwen;
- Chen, Gengxu;
- Xie, Junhua;
- Ma, Zhijun;
- Peng, Mingying
- Article
14
- 2014
- Miura, Ryosuke;
- Ando, Yasunari;
- Hotta, Yasuhisa;
- Nagatani, Yoshiki;
- Tsuda, Akihiko
- Other
15
- ChemPlusChem, 2014, v. 79, n. 4, p. 512, doi. 10.1002/cplu.201300420
- Wang, Yu;
- Chen, Gang;
- Di, Andi;
- Xu, Haiming
- Article
16
- ChemPlusChem, 2014, v. 79, n. 4, p. 524, doi. 10.1002/cplu.201300385
- Liao, Jingwen;
- Ning, Chengyun;
- Tan, Guoxin;
- Ni, Guoxin;
- Pan, Haobo
- Article
17
- ChemPlusChem, 2014, v. 79, n. 4, p. 486, doi. 10.1002/cplu.201400001
- Broggi, Alessandra;
- Tomasi, Ivan;
- Bianchi, Luca;
- Marrocchi, Assunta;
- Vaccaro, Luigi
- Article
18
- ChemPlusChem, 2014, v. 79, n. 4, p. 471, doi. 10.1002/cplu.201400012
- Miura, Ryosuke;
- Ando, Yasunari;
- Hotta, Yasuhisa;
- Nagatani, Yoshiki;
- Tsuda, Akihiko
- Article
19
- ChemPlusChem, 2014, v. 79, n. 4, p. 552, doi. 10.1002/cplu.201400005
- Berger, Gilles;
- Soubhye, Jalal;
- van der Lee, Arie;
- Vande Velde, Christophe;
- Wintjens, René;
- Dubois, Philippe;
- Clément, Sébastien;
- Meyer, Franck
- Article
21
- ChemPlusChem, 2014, v. 79, n. 4, p. 577, doi. 10.1002/cplu.201300431
- Pu, Jun;
- Wang, Tingting;
- Wang, Haiyang;
- Tong, Yao;
- Lu, Chenchen;
- Kong, Wei;
- Wang, Zhenghua
- Article
22
- ChemPlusChem, 2014, v. 79, n. 4, p. 480, doi. 10.1002/cplu.201490011
- Article
23
- ChemPlusChem, 2014, v. 79, n. 4, p. 531, doi. 10.1002/cplu.201300321
- Murai, Kazuki;
- Higuchi, Masahiro;
- Kuno, Tatsuya;
- Kato, Katsuya
- Article
24
- ChemPlusChem, 2014, v. 79, n. 4, p. 569, doi. 10.1002/cplu.201300435
- He, Shuai;
- Lu, Chang;
- Wang, Guang‐Sheng;
- Wang, Jia‐Wei;
- Guo, Hao‐Yue;
- Guo, Lin
- Article