Surface Topography of Silicon Nitride Nanostructured Thin Films Prepared by Reactive Sputtering.
- Published in:
- Iraqi Journal of Applied Physics Letters, 2024, v. 7, n. 4, p. 18
- By:
- Publication type:
- Article
Works matching IS 1999656X AND DT 2024 AND VI 7 AND IP 4
Results: 6
1
2
Electrical Characteristics of DC Glow-Discharge Plasma under Different Operation Conditions.
- Published in:
- Iraqi Journal of Applied Physics Letters, 2024, v. 7, n. 4, p. 15
- By:
- Publication type:
- Article
3
Titanium Dioxide Nanostructured Thin Films Prepared at Different Substrate Temperatures by Pulsed-Laser Deposition.
- Published in:
- Iraqi Journal of Applied Physics Letters, 2024, v. 7, n. 4, p. 12
- By:
- Publication type:
- Article
4
Effect of Thermal Annealing on Optical Properties of Carbon Nitride Nanostructures Synthesized by Discharge-Induced Reaction of Methane and Ammonia.
- Published in:
- Iraqi Journal of Applied Physics Letters, 2024, v. 7, n. 4, p. 9
- By:
- Publication type:
- Article
5
Sheet Resistance of Cobalt/Silicon Ohmic Contacts Fabricated by Laser-Induced Diffusion.
- Published in:
- Iraqi Journal of Applied Physics Letters, 2024, v. 7, n. 4, p. 3
- By:
- Publication type:
- Article
6
Morphological Characteristics of Plasma-Etched Silicon Substrates Coated with Nickel Oxide Nanoparticles for Optoelectronics Applications.
- Published in:
- Iraqi Journal of Applied Physics Letters, 2024, v. 7, n. 4, p. 6
- By:
- Publication type:
- Article