Works matching IS 19342659 AND DT 2025 AND VI 20 AND IP 2
1
- Chemical Product & Process Modeling, 2025, v. 20, n. 2, p. i, doi. 10.1515/cppm-2025-frontmatter2
- Article
2
- Chemical Product & Process Modeling, 2025, v. 20, n. 2, p. 175, doi. 10.1515/cppm-2025-0067
- Piper, Mark;
- Brinkmann, Ulf
- Article
3
- Chemical Product & Process Modeling, 2025, v. 20, n. 2, p. 309, doi. 10.1515/cppm-2024-0070
- Gambaryan-Roisman, Tatiana
- Article
4
- Chemical Product & Process Modeling, 2025, v. 20, n. 2, p. 277, doi. 10.1515/cppm-2024-0037
- Vishwakarma, Vineet;
- Marchini, Sara;
- Schleicher, Eckhard;
- Schubert, Markus;
- Hampel, Uwe
- Article
5
- Chemical Product & Process Modeling, 2025, v. 20, n. 2, p. 241, doi. 10.1515/cppm-2024-0036
- Murasiewicz, Halina;
- Maćkowiak, Jerzy;
- Maćkowiak, Jan;
- Chromik, Reiner;
- Rakoczy, Rafal
- Article
6
- Chemical Product & Process Modeling, 2025, v. 20, n. 2, p. 293, doi. 10.1515/cppm-2024-0035
- Li, Qing;
- Somoza-Tornos, Ana;
- Kiss, Anton A.
- Article
7
- Chemical Product & Process Modeling, 2025, v. 20, n. 2, p. 179, doi. 10.1515/cppm-2024-0028
- Iliuta, Ion;
- Larachi, Faïçal
- Article
8
- Chemical Product & Process Modeling, 2025, v. 20, n. 2, p. 257, doi. 10.1515/cppm-2024-0009
- Jama, Mohamed Ali;
- Buffo, Antonio;
- Zhao, Wenli;
- Alopaeus, Ville
- Article
9
- Chemical Product & Process Modeling, 2025, v. 20, n. 2, p. 221, doi. 10.1515/cppm-2023-0102
- Ganguli, Arijit A.;
- Tabib, Mandar V.;
- Deshpande, Sagar S.;
- Raval, Mehul S.
- Article