Works matching IS 18800688 AND DT 2011 AND VI 6 AND IP 2


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    Modular EUV Source for the Next Generation Lithography.

    Published in:
    Journal of Laser Micro / Nanoengineering, 2011, v. 6, n. 2, p. 113, doi. 10.2961/jlmn.2011.02.0004
    By:
    • Sublemontier, Olivier;
    • Rosset-Kos, Marylène;
    • Ceccotti, Tiberio;
    • Hergott, Jean-François;
    • Auguste, Thierry;
    • Normand, Didier;
    • Schmidt, Martin;
    • Beaumont, François;
    • Farcage, Daniel;
    • Cheymol, Guy;
    • Caro, Jean-Marc Le;
    • Cormont, Philippe;
    • Mauchien, Patrick;
    • Thro, Pierre-Yves;
    • Skrzypczak, Jacky;
    • Muller, Sophie;
    • Marquis, Emanuel;
    • Barthod, Benoît;
    • Gaurand, Isabelle;
    • Davenet, Magali
    Publication type:
    Article
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