Works matching IS 16128850 AND DT 2020 AND VI 17 AND IP 3
Results: 11
Issue Information: Plasma Process. Polym. 3/2020.
- Published in:
- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.202070006
- Publication type:
- Article
Cover Picture: Plasma Process. Polym. 3/2020.
- Published in:
- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.202070005
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- Publication type:
- Article
Synthesis of p‐type N‐doped TiO<sub>2</sub> thin films by co‐reactive magnetron sputtering.
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- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.201900203
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- Article
Helium plasma jet interactions with water in well plates.
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- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.201900179
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- Article
Insights into switchable thermoresponsive copolymer layers by atmospheric pressure plasma‐initiated chemical vapour deposition.
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- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.201900172
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- Article
Surface modification of albumin/gelatin films gelled on low‐temperature plasma‐treated polyethylene terephthalate plates.
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- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.201900171
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- Publication type:
- Article
Characterization of a microwave plasma jet (TIAGO) in‐contact with water: Application in degradation of methylene blue dye.
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- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.201900157
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- Article
Plasma deposition of collagen for cell‐culture applications.
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- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.201900147
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- Article
Mode transition and plasma characteristics of nanosecond pulse gas–liquid discharge: Effect of grounding configuration.
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- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.201900146
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- Publication type:
- Article
Plasma‐activated water to improve the stress tolerance of barley.
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- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.201900123
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- Article
Radial distribution of C<sub>4</sub>H<sub>8</sub>–H<sub>2</sub>–TMS plasma during plasma‐enhanced chemical vapor deposition of Si‐doped glow discharge polymers.
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- Plasma Processes & Polymers, 2020, v. 17, n. 3, p. 1, doi. 10.1002/ppap.201900075
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- Article