Electron beam-treated organic monolayers as a negative resist for Cu immersion plating on Si.
- Published in:
- Journal of Solid State Electrochemistry, 2004, v. 8, n. 10, p. 772, doi. 10.1007/s10008-004-0544-7
- By:
- Publication type:
- Article
Works matching IS 14328488 AND DT 2004 AND VI 8 AND IP 10
Results: 4
1
2
Adsorption of N-dodecyl- N, N-dimethyl-3-ammonio-1-propanesulfonate (DDAPS), a model zwitterionic surfactant, on the Au(111) electrode surface.
- Published in:
- Journal of Solid State Electrochemistry, 2004, v. 8, n. 10, p. 693
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- Publication type:
- Article
3
Electrochromic and structural characteristics of mesoporous WO <sub>3</sub> films prepared by a sol-gel method.
- Published in:
- Journal of Solid State Electrochemistry, 2004, v. 8, n. 10, p. 748
- By:
- Publication type:
- Article
4
Application of AC impedance techniques to Scanning Electrochemical Microscopy.
- Published in:
- Journal of Solid State Electrochemistry, 2004, v. 8, n. 10, p. 683
- By:
- Publication type:
- Article