Works matching IS 14060086 AND DT 2003 AND VI 52 AND IP 3
Results: 9
Optical coatings grown by atomic layer deposition for high-power laser applications.
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- Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 321
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Effects of growth temperature on the properties of HfO[sub2] films grown by atomic layer deposition.
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- Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 308
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Analysis of Zn(O,S) films for Cu(In,Ga)Se[sub2] solar cells.
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- Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 299
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Spectroscopic characterization of ZrO[sub2] thin films grown by atomic layer deposition.
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- Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 289, doi. 10.3176/phys.math.2003.3.05
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Atomic layer deposition of ZnO thin films and dot structures.
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- Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 277
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Atomic layer deposition: a key technology for the controlled growth of oxide thin films for advanced applications.
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- Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 266, doi. 10.3176/phys.math.2003.3.03
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High-temperature atomic layer epitaxy of TiO[sub2] from TiCl[sub4] and H[sub2]O[sub2]--H[sub2]O.
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- Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 257, doi. 10.3176/phys.math.2003.3.02
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Precursor design of vapour deposited cubic boron nitride versus diamond.
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- Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 245, doi. 10.3176/phys.math.2003.3.01
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Preface.
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- Proceedings of the Estonian Academy of Sciences, Physics, Mathematics, 2003, v. 52, n. 3, p. 243
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