Works matching IS 13880764 AND DT 2017 AND VI 19 AND IP 11

Control of nanoparticle size and amount by using the mesh grid and applying DC-bias to the substrate in silane ICP-CVD process.

Published in:

Journal of Nanoparticle Research, 2017, v. 19, n. 11, p. 1, doi. 10.1007/s11051-017-4068-3

By:

• Yoo, Seung-Wan;
• Hwang, Nong-Moon;
• You, Shin-Jae;
• Kim, Jung-Hyung;
• Seong, Dae-Jin

Publication type:

Article