Works matching IS 10637826 AND DT 2018 AND VI 52 AND IP 9
Results: 23
Raman Spectra of Thick Epitaxial GaN Layers Formed on SiC by the Sublimation Sandwich Method.
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- Semiconductors, 2018, v. 52, n. 9, p. 1225, doi. 10.1134/S1063782618090026
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Lowering the Lasing Threshold by Doping in Mid-Infrared Lasers Based on HgCdTe with HgTe Quantum Wells.
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- Semiconductors, 2018, v. 52, n. 9, p. 1221, doi. 10.1134/S1063782618090038
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GaSb/GaAlAsSb Heterostructure Photodiodes for the Near-IR Spectral Range.
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- Semiconductors, 2018, v. 52, n. 9, p. 1215, doi. 10.1134/S1063782618090099
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Low-Frequency Dielectric Relaxation in Iron-Doped Ge<sub>28.5</sub>Pb<sub>15</sub>S<sub>56.5</sub> Glassy System.
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- Semiconductors, 2018, v. 52, n. 9, p. 1160, doi. 10.1134/S1063782618090051
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On the Impact of Barrier-Layer Doping on the Photoluminescence Efficiency of InGaAlAs/InGaAs/InP Strained-Layer Heterostructures.
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- Semiconductors, 2018, v. 52, n. 9, p. 1156, doi. 10.1134/S1063782618090075
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Study of the Structural and Emission Properties of Ge(Si) Quantum Dots Ordered on the Si(001) Surface.
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- Semiconductors, 2018, v. 52, n. 9, p. 1150, doi. 10.1134/S1063782618090191
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Quantization of the Electromagnetic Field in Three-Dimensional Photonic Structures on the Basis of the Scattering Matrix Formalism (S Quantization).
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- Semiconductors, 2018, v. 52, n. 9, p. 1145, doi. 10.1134/S106378261809004X
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Size-Dependent Optical Properties of Colloidal CdS Quantum Dots Passivated by Thioglycolic Acid.
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- Semiconductors, 2018, v. 52, n. 9, p. 1137, doi. 10.1134/S1063782618090087
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Backward-Diode Heterostructure Based on a Zinc-Oxide Nanoarray Formed by Pulsed Electrodeposition and a Cooper-Iodide Film Grown by the SILAR Method.
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- Semiconductors, 2018, v. 52, n. 9, p. 1203, doi. 10.1134/S1063782618090063
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Intercalation of C<sub>60</sub> Fullerene Molecules under Single-Layer Graphene on Molybdenum Carbide.
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- Semiconductors, 2018, v. 52, n. 9, p. 1198, doi. 10.1134/S1063782618090130
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Transport and Photosensitivity in Structures: A Composite Layer of Silicon and Gold Nanoparticles on p-Si.
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- Semiconductors, 2018, v. 52, n. 9, p. 1193, doi. 10.1134/S106378261809021X
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Effect of Injection Depletion in p-Si-n-(Si<sub>2</sub>)<sub>1 -</sub><sub>x</sub>(ZnSe)<sub>x</sub> (0 ≤ x ≤ 0.01) Heterostructure.
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- Semiconductors, 2018, v. 52, n. 9, p. 1188, doi. 10.1134/S1063782618090142
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On the Formation of IR-Light-Emitting Ge Nanocrystals in Ge:SiO<sub>2</sub> Films.
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- Semiconductors, 2018, v. 52, n. 9, p. 1178, doi. 10.1134/S1063782618090233
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Electrical Properties and Energy Parameters of n-FeS<sub>2</sub>/p-Cd<sub>1 -</sub><sub>x</sub>Zn<sub>x</sub>Te Heterojunctions.
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- Semiconductors, 2018, v. 52, n. 9, p. 1171, doi. 10.1134/S1063782618090117
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Effect of Conditions of Electrochemical Etching on the Morphological, Structural, and Optical Properties of Porous Gallium Arsenide.
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- Semiconductors, 2018, v. 52, n. 9, p. 1163, doi. 10.1134/S1063782618090154
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Electric-Field Behavior of the Resonance Features of the Tunneling Photocurrent Component in InAs(QD)/GaAs Heterostructures.
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- Semiconductors, 2018, v. 52, n. 9, p. 1129, doi. 10.1134/S1063782618090129
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Template Synthesis of Monodisperse Spherical Nanocomposite SiO<sub>2</sub>/GaN:Eu<sup>3+</sup> Particles.
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- Semiconductors, 2018, v. 52, n. 9, p. 1123, doi. 10.1134/S1063782618090208
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Structure and Electrical Properties of Zirconium-Doped Tin-Oxide Films.
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- Semiconductors, 2018, v. 52, n. 9, p. 1118, doi. 10.1134/S106378261809018X
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Poole-Frenkel Effect and the Opportunity of Its Application for the Prediction of Radiation Charge Accumulation in Thermal Silicon Dioxide.
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- Semiconductors, 2018, v. 52, n. 9, p. 1114, doi. 10.1134/S1063782618090166
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Superficial Defect Formation in CdTe under the Radiation Effect of a CO<sub>2</sub> Laser.
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- Semiconductors, 2018, v. 52, n. 9, p. 1110, doi. 10.1134/S1063782618090178
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Effect of High-Dose Carbon Implantation on the Phase Composition, Morphology, and Field-Emission Properties of Silicon Crystals.
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- Semiconductors, 2018, v. 52, n. 9, p. 1104, doi. 10.1134/S1063782618090245
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Optical Properties and the Mechanism of the Formation of V<sub>2</sub>O<sub>2</sub> and V<sub>3</sub>O<sub>2</sub> Vacancy-Oxygen Complexes in Irradiated Silicon Crystals.
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- Semiconductors, 2018, v. 52, n. 9, p. 1097, doi. 10.1134/S1063782618090221
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Calculation of the Influence of the Ion Current Density and Temperature on the Accumulation Kinetics of Point Defects under the Irradiation of Si with Light Ions.
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- Semiconductors, 2018, v. 52, n. 9, p. 1091, doi. 10.1134/S1063782618090105
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