Works matching IS 10637826 AND DT 2016 AND VI 50 AND IP 3
Results: 23
On Measurements of the Electrons and Holes Impact-Ionization Coefficients in 4 H-SiC.
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- Semiconductors, 2016, v. 50, n. 3, p. 289, doi. 10.1134/S1063782616030143
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Effect of Phonon Drag on the Thermopower in a Parabolic Quantum Well.
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- Semiconductors, 2016, v. 50, n. 3, p. 295, doi. 10.1134/S106378261603009X
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A Quasi-Classical Model of the Hubbard Gap in Lightly Compensated Semiconductors.
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- Semiconductors, 2016, v. 50, n. 3, p. 299, doi. 10.1134/S1063782616030192
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Deep Centers at the Interface in InGaTe/InAs and InTe/InAs Heterostructures.
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- Semiconductors, 2016, v. 50, n. 3, p. 309, doi. 10.1134/S1063782616030076
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Role of Acoustoelectric Interaction in the Formation of Nanoscale Periodic Structures of Adsorbed Atoms.
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- Semiconductors, 2016, v. 50, n. 3, p. 314, doi. 10.1134/S1063782616030180
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Investigation of Ion-Implanted Photosensitive Silicon Structures by Electrochemical Capacitance-Voltage Profiling.
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- Semiconductors, 2016, v. 50, n. 3, p. 320, doi. 10.1134/S1063782616030234
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Study of the Electron Distribution in GaN and GaAs after γ-Neutron Irradiation.
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- Semiconductors, 2016, v. 50, n. 3, p. 326, doi. 10.1134/S1063782616030222
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Electrical and Photoelectric Properties of the TiN/ p-InSe Heterojunction.
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- Semiconductors, 2016, v. 50, n. 3, p. 334, doi. 10.1134/S1063782616030167
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Layer-by-Layer Analysis of the Thickness Distribution of Silicon Dioxide in the Structure SiO/Si(111) by Inelastic Electron Scattering Cross-Section Spectroscopy.
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- Semiconductors, 2016, v. 50, n. 3, p. 339, doi. 10.1134/S1063782616030179
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Epitaxially Grown Monoisotopic Si, Ge, and SiGe Alloy Layers: Production and Some Properties.
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- Semiconductors, 2016, v. 50, n. 3, p. 345, doi. 10.1134/S1063782616030064
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Two Stages of Surface-Defect Formation in a MOS Structure under Low-Dose Rate Gamma Irradiation.
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- Semiconductors, 2016, v. 50, n. 3, p. 349, doi. 10.1134/S1063782616030209
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On Controlling the Hydrophobicity of Nanostructured Zinc-Oxide Layers Grown by Pulsed Electrodeposition.
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- Semiconductors, 2016, v. 50, n. 3, p. 352, doi. 10.1134/S106378261603012X
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Photoluminescence and Confinement of Excitons in Disordered Porous Films.
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- Semiconductors, 2016, v. 50, n. 3, p. 364, doi. 10.1134/S1063782616030039
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Influence of the Surface Layer on the Electrochemical Deposition of Metals and Semiconductors into Mesoporous Silicon.
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- Semiconductors, 2016, v. 50, n. 3, p. 372, doi. 10.1134/S1063782616030040
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Model of Adsorption on Amorphous Graphene.
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- Semiconductors, 2016, v. 50, n. 3, p. 377, doi. 10.1134/S1063782616030052
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Optical and Structural Properties of Composite Si:Au Layers Formed by Laser Electrodispersion.
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- Semiconductors, 2016, v. 50, n. 3, p. 418, doi. 10.1134/S1063782616030118
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Model Development for Current-Voltage and Transconductance Characteristics of Normally-off AlN/GaN MOSHEMT.
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- Semiconductors, 2016, v. 50, n. 3, p. 384, doi. 10.1134/S1063782616030210
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High-Power Thyristor Switching via an Overvoltage Pulse with Nanosecond Rise Time.
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- Semiconductors, 2016, v. 50, n. 3, p. 394, doi. 10.1134/S1063782616030106
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High-Voltage Silicon-Carbide Thyristor with an n-type Blocking Base.
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- Semiconductors, 2016, v. 50, n. 3, p. 404, doi. 10.1134/S1063782616030155
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Effect of the Ti-Nanolayer Thickness on the Self-Lift-off of Thick GaN Epitaxial Layers.
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- Semiconductors, 2016, v. 50, n. 3, p. 411, doi. 10.1134/S1063782616030246
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Formation of Cadmium-Sulfide Nanowhiskers via Vacuum Evaporation and Condensation in a Quasi-Closed Volume.
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- Semiconductors, 2016, v. 50, n. 3, p. 415, doi. 10.1134/S1063782616030027
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Microdisk Injection Lasers for the 1.27-μm Spectral Range.
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- Semiconductors, 2016, v. 50, n. 3, p. 390, doi. 10.1134/S1063782616030131
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Ab Initio Calculations of Phonon Dispersion in ZnGaSe.
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- Semiconductors, 2016, v. 50, n. 3, p. 285, doi. 10.1134/S1063782616030088
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