Works matching IS 10637826 AND DT 2013 AND VI 47 AND IP 2
Results: 22
Determination of the thickness and spectral dependence of the refractive index of AlInSb epitaxial layers from reflectance spectra.
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- Semiconductors, 2013, v. 47, n. 2, p. 292, doi. 10.1134/S1063782613020140
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Monoisotopic silicon Si in spin resonance spectroscopy of electrons localized at donors.
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- Semiconductors, 2013, v. 47, n. 2, p. 203, doi. 10.1134/S1063782613020073
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Damage formation in Si under irradiation with PF ions of different energies.
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- Semiconductors, 2013, v. 47, n. 2, p. 242, doi. 10.1134/S1063782613020115
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Shallow-donor lasers in uniaxially stressed silicon.
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- Semiconductors, 2013, v. 47, n. 2, p. 235, doi. 10.1134/S1063782613020152
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High-efficiency GaSb photocells.
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- Semiconductors, 2013, v. 47, n. 2, p. 307, doi. 10.1134/S1063782613020139
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Aligned arrays of zinc oxide nanorods on silicon substrates.
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- Semiconductors, 2013, v. 47, n. 2, p. 252, doi. 10.1134/S1063782613020176
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Recrystallization of silicon-on-sapphire structures at various amorphization-ion-beam energies.
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- Semiconductors, 2013, v. 47, n. 2, p. 298, doi. 10.1134/S1063782613020036
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Electron levels and luminescence of dislocation networks formed by the hydrophilic bonding of silicon wafers.
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- Semiconductors, 2013, v. 47, n. 2, p. 259, doi. 10.1134/S1063782613020061
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Optical properties of silicon with a high content of boron.
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- Semiconductors, 2013, v. 47, n. 2, p. 269, doi. 10.1134/S1063782613020127
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Annealing kinetics of boron-containing centers in electron-irradiated silicon.
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- Semiconductors, 2013, v. 47, n. 2, p. 228, doi. 10.1134/S1063782613020085
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Photoresponse recovery in silicon photodiodes upon VUV irradiation.
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- Semiconductors, 2013, v. 47, n. 2, p. 213, doi. 10.1134/S1063782613020243
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The electrically active centers in oxygen-implanted silicon.
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- Semiconductors, 2013, v. 47, n. 2, p. 285, doi. 10.1134/S1063782613020164
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Structure and transport properties of nanocarbon films prepared by sublimation on a 6 H-SiC surface.
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- Semiconductors, 2013, v. 47, n. 2, p. 301, doi. 10.1134/S1063782613020024
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Light emission from silicon nanocrystals.
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- Semiconductors, 2013, v. 47, n. 2, p. 183, doi. 10.1134/S1063782613020103
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Radiation effects in Si-Ge quantum size structure (Review).
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- Semiconductors, 2013, v. 47, n. 2, p. 217, doi. 10.1134/S1063782613020188
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Influence of metal impurities on recombination activity of dislocations in multicrystalline silicon.
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- Semiconductors, 2013, v. 47, n. 2, p. 232, doi. 10.1134/S1063782613020097
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Silicon with an increased content of monoatomic sulfur centers: Sample fabrication and optical spectroscopy.
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- Semiconductors, 2013, v. 47, n. 2, p. 247, doi. 10.1134/S1063782613020048
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Electrically active centers formed in silicon during the high-temperature diffusion of boron and aluminum.
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- Semiconductors, 2013, v. 47, n. 2, p. 289, doi. 10.1134/S106378261302019X
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Regularities in the formation of dislocation networks on the boundary of bonded Si(001) wafers.
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- Semiconductors, 2013, v. 47, n. 2, p. 264, doi. 10.1134/S106378261302022X
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Identification of copper-copper and copper-hydrogen complexes in silicon.
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- Semiconductors, 2013, v. 47, n. 2, p. 275, doi. 10.1134/S1063782613020231
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Tunnel field-effect transistors with graphene channels.
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- Semiconductors, 2013, v. 47, n. 2, p. 279, doi. 10.1134/S1063782613020218
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Utilization of silicon detectors with 'ideal-diode' current-voltage characteristics.
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- Semiconductors, 2013, v. 47, n. 2, p. 209, doi. 10.1134/S1063782613020206
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