Works matching IS 10427147 AND DT 2010 AND VI 21 AND IP 3
1
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 205, doi. 10.1002/pat.1417
- Goel, Shubhra;
- Mazumdar, Nasreen A.;
- Gupta, Alka
- Article
2
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 211, doi. 10.1002/pat.1426
- Masuda, Yoshitake;
- Kato, Kazumi
- Article
3
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 153, doi. 10.1002/pat.1408
- Zhenglin Tang;
- Li Qi;
- Guitian Gao
- Article
4
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 224, doi. 10.1002/pat.1410
- Takahashi, Masanori;
- Taguchi, Yoshinari;
- Tanaka, Masato
- Article
5
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 164, doi. 10.1002/pat.1411
- Jyh-Horng Wu;
- Chia-Hao Li;
- Hsien-Tang Chiu;
- Zhi-Jian Shong;
- Peir-An Tsai
- Article
6
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 158, doi. 10.1002/pat.1409
- Mugisawa, Masaki;
- Orita, Akihiro;
- Otera, Junzo;
- Sawada, Hideo
- Article
7
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 170, doi. 10.1002/pat.1412
- Qi-chao Ran;
- Qiao Tian;
- Cao Li;
- Yi Gu
- Article
8
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 177, doi. 10.1002/pat.1413
- Yuewen Hu;
- Qianghua Wu;
- Baojun Qu
- Article
9
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 183, doi. 10.1002/pat.1414
- Tao Yu;
- Jie Ren;
- Shuying Gu;
- Ming Yang
- Article
10
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 189, doi. 10.1002/pat.1415
- Guiping Ma;
- Dongzhi Yang;
- Dandan Su;
- Xueyan Mu;
- Kennedy, John F.;
- Jun Nie
- Article
11
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 196, doi. 10.1002/pat.1416
- Xiaohua Qi;
- Mingzhu Liu;
- Zhenbin Chen;
- Fen Zhang;
- Lu Zhao
- Article
12
- Polymers for Advanced Technologies, 2010, v. 21, n. 3, p. 216, doi. 10.1002/pat.1492
- Huseyin Zengin;
- Erkan, Belgin
- Article