Editorial.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 71
- By:
- Publication type:
- Article
Works matching IS 10427147 AND DT 2006 AND VI 17 AND IP 2
Results: 8
1
2
Advanced materials for 193 nm immersion lithographyPaper presented as part of a special issue on lighography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 122
- By:
- Publication type:
- Article
3
ArF excimer laser resists based on fluoroalcoholPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 104
- By:
- Publication type:
- Article
4
Depth profile and line‐edge roughness of partially O‐1‐ethoxyethylated low molecular weight amorphous polyphenol and poly(p‐hydroxystyrene) base resists for electron‐beam lithographyPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 116
- By:
- Publication type:
- Article
5
Recent developments in the use of two‐photon polymerization in precise 2D and 3D microfabricationsPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 72
- By:
- Publication type:
- Article
6
Fabricating three‐dimensional polymeric photonic structures by multi‐beam interference lithographyPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 83
- By:
- Publication type:
- Article
7
Recent progress in high resolution lithographyPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 94
- By:
- Publication type:
- Article
8
Direct patterning of poly(amic acid) and low‐temperature imidization using a photo‐base generatorPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 131
- By:
- Publication type:
- Article