Works matching IS 10427147 AND DT 2006 AND VI 17 AND IP 2
Results: 8
Editorial.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 71
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- Publication type:
- Article
Advanced materials for 193 nm immersion lithographyPaper presented as part of a special issue on lighography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 122
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- Publication type:
- Article
Direct patterning of poly(amic acid) and low‐temperature imidization using a photo‐base generatorPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 131
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- Publication type:
- Article
Depth profile and line‐edge roughness of partially O‐1‐ethoxyethylated low molecular weight amorphous polyphenol and poly(p‐hydroxystyrene) base resists for electron‐beam lithographyPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 116
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- Publication type:
- Article
Recent developments in the use of two‐photon polymerization in precise 2D and 3D microfabricationsPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 72
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- Publication type:
- Article
Fabricating three‐dimensional polymeric photonic structures by multi‐beam interference lithographyPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 83
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- Publication type:
- Article
Recent progress in high resolution lithographyPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 94
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- Publication type:
- Article
ArF excimer laser resists based on fluoroalcoholPaper presented as part of a special issue on lithography.
- Published in:
- Polymers for Advanced Technologies, 2006, v. 17, n. 2, p. 104
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- Publication type:
- Article