Works matching IS 10427147 AND DT 2000 AND VI 11 AND IP 3
1
- Polymers for Advanced Technologies, 2000, v. 11, n. 3, p. 145, doi. 10.1002/1099-1581(200003)11:3<145::AID-PAT966>3.0.CO;2-2
- Ha, Chang-Sik;
- Cho, Won-Jei
- Article
2
- Polymers for Advanced Technologies, 2000, v. 11, n. 3, p. 136, doi. 10.1002/1099-1581(200003)11:3<136::AID-PAT961>3.0.CO;2-F
- Ito, Yoshihiro;
- Soon Park, Yong
- Article
3
- Polymers for Advanced Technologies, 2000, v. 11, n. 3, p. 127, doi. 10.1002/1099-1581(200003)11:3<127::AID-PAT954>3.0.CO;2-5
- Wang, C. L.;
- Kuo, Y. M.;
- Chao, D. Y.
- Article
4
- Polymers for Advanced Technologies, 2000, v. 11, n. 3, p. 122, doi. 10.1002/1099-1581(200003)11:3<122::AID-PAT953>3.0.CO;2-N
- Kadokawa, Jun-ichi;
- Tagaya, Hideyuki
- Article
5
- Polymers for Advanced Technologies, 2000, v. 11, n. 3, p. 101, doi. 10.1002/1099-1581(200003)11:3<101::AID-PAT950>3.0.CO;2-0
- Chen, Jinhua;
- Tsubokawa, Norio
- Article