Works matching IS 10427147 AND DT 1994 AND VI 5 AND IP 1

Results: 10

Calculation of heat transfer and uniformity of chemical amplification during post-exposure bake.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 22, doi. 10.1002/pat.1994.220050104

By:

Ban, Hiroshi;
Sakai, Tomoaki;
Saito, Kenichi

Publication type:

Article

Excited state properties of a new photoinitiating system for laser imaging applications.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 56, doi. 10.1002/pat.1994.220050108

By:

Morlet-Savary, F.;
Fouassier, J. P.;
Matsumoto, T.;
Inomata, K.

Publication type:

Article

Progress in the chemistry of organosilicon resists.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 70, doi. 10.1002/pat.1994.220050110

By:

Gozdz, Antoni S.

Publication type:

Article

193 nm resists and lithography.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 12, doi. 10.1002/pat.1994.220050103

By:

Kunz, Roderick R.;
Allen, Robert D.;
Hartney, Mark A.;
Hinsberg, William D.;
Horn, Mark W.;
Keast, Craig L.;
Rothschild, Mordechai;
Shaver, David C.;
Wallraff, Gregory M.

Publication type:

Article

The 1.4 and 248 nm radiation response of chemically amplified resists containing arylmethyl sulfone photoacid generators.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 49, doi. 10.1002/pat.1994.220050107

By:

Hanson, J. E.;
Pingor, D. A.;
Novembre, A. E.;
Mixon, D. A.;
Bohrer, M. P.;
Kometani, J. M.;
Tai, W. W.

Publication type:

Article

Resist performances and structure of phenolic resins using multi-substituted phenols.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 2, doi. 10.1002/pat.1994.220050102

By:

Kajita, Toru;
Ota, Toshiyuki;
Tsuji, Akira

Publication type:

Article

Functionalized polymers for high-resolution photolithography.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 41, doi. 10.1002/pat.1994.220050106

By:

Sebald, Michael;
Ahne, Hellmut;
Leuschner, Rainer;
Sezi, Recai

Publication type:

Article

Editorial: Advances in polymeric resist materials for microlithography.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 1, doi. 10.1002/pat.1994.220050101

By:

Bowden, M. J.

Publication type:

Article

Lithographic performance of isomeric hydroxystyrene polymers.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 28, doi. 10.1002/pat.1994.220050105

By:

Dammel, R.;
Rahman, M. D.;
Lu, P. H.;
Elango, V.

Publication type:

Article

Photochemical generation of cationic lewis acids via deligation of metal-sandwich complexes.

Published in:

Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 63, doi. 10.1002/pat.1994.220050109

By:

Gamble, Gary;
Kutal, Charles

Publication type:

Article