Works matching IS 10427147 AND DT 1994 AND VI 5 AND IP 1

Results: 10

Calculation of heat transfer and uniformity of chemical amplification during post-exposure bake.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 22, doi. 10.1002/pat.1994.220050104
By:
- Ban, Hiroshi;
- Sakai, Tomoaki;
- Saito, Kenichi
Publication type:
Article
Excited state properties of a new photoinitiating system for laser imaging applications.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 56, doi. 10.1002/pat.1994.220050108
By:
- Morlet-Savary, F.;
- Fouassier, J. P.;
- Matsumoto, T.;
- Inomata, K.
Publication type:
Article
Progress in the chemistry of organosilicon resists.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 70, doi. 10.1002/pat.1994.220050110
By:
- Gozdz, Antoni S.
Publication type:
Article
193 nm resists and lithography.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 12, doi. 10.1002/pat.1994.220050103
By:
- Kunz, Roderick R.;
- Allen, Robert D.;
- Hartney, Mark A.;
- Hinsberg, William D.;
- Horn, Mark W.;
- Keast, Craig L.;
- Rothschild, Mordechai;
- Shaver, David C.;
- Wallraff, Gregory M.
Publication type:
Article
The 1.4 and 248 nm radiation response of chemically amplified resists containing arylmethyl sulfone photoacid generators.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 49, doi. 10.1002/pat.1994.220050107
By:
- Hanson, J. E.;
- Pingor, D. A.;
- Novembre, A. E.;
- Mixon, D. A.;
- Bohrer, M. P.;
- Kometani, J. M.;
- Tai, W. W.
Publication type:
Article
Resist performances and structure of phenolic resins using multi-substituted phenols.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 2, doi. 10.1002/pat.1994.220050102
By:
- Kajita, Toru;
- Ota, Toshiyuki;
- Tsuji, Akira
Publication type:
Article
Functionalized polymers for high-resolution photolithography.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 41, doi. 10.1002/pat.1994.220050106
By:
- Sebald, Michael;
- Ahne, Hellmut;
- Leuschner, Rainer;
- Sezi, Recai
Publication type:
Article
Editorial: Advances in polymeric resist materials for microlithography.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 1, doi. 10.1002/pat.1994.220050101
By:
- Bowden, M. J.
Publication type:
Article
Lithographic performance of isomeric hydroxystyrene polymers.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 28, doi. 10.1002/pat.1994.220050105
By:
- Dammel, R.;
- Rahman, M. D.;
- Lu, P. H.;
- Elango, V.
Publication type:
Article
Photochemical generation of cationic lewis acids via deligation of metal-sandwich complexes.
Published in:
Polymers for Advanced Technologies, 1994, v. 5, n. 1, p. 63, doi. 10.1002/pat.1994.220050109
By:
- Gamble, Gary;
- Kutal, Charles
Publication type:
Article