Works matching IS 09574522 AND DT 2009 AND VI 20 AND IP 12


Results: 18
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    A novel selective removal process of cobalt silicide.

    Published in:
    Journal of Materials Science: Materials in Electronics, 2009, v. 20, n. 12, p. 1164, doi. 10.1007/s10854-008-9845-4
    By:
    • Benedetto Bozzini;
    • Lucia D'Urzo;
    • Marcello Della Pia;
    • Kuan Chen Yu;
    • Qin Qin Yu
    Publication type:
    Article
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