Works matching IS 09359648 AND DT 2005 AND VI 17 AND IP 17
1
- Advanced Materials, 2005, v. 17, n. 17, p. 2149, doi. 10.1002/adma.200590087
- Article
2
- Advanced Materials, 2005, v. 17, n. 17, p. 2147, doi. 10.1002/adma.200590089
- M. S. Bradley;
- J. R. Tischler;
- V. Bulović
- Article
3
- Advanced Materials, 2005, v. 17, n. 17, p. 2138
- M. Mozetič;
- U. Cvelbar;
- M. K. Sunkara;
- S. Vaddiraju
- Article
4
- Advanced Materials, 2005, v. 17, n. 17, p. 2027, doi. 10.1002/adma.200590085
- Article
5
- Advanced Materials, 2005, v. 17, n. 17, p. 2107, doi. 10.1002/adma.200500885
- J. Zhou;
- Y. Ding;
- S. Z. Deng;
- L. Gong;
- N. S. Xu;
- Z. L. Wang
- Article
6
- Advanced Materials, 2005, v. 17, n. 17, p. 2142, doi. 10.1002/adma.200500789
- Article
7
- Advanced Materials, 2005, v. 17, n. 17, p. 2073, doi. 10.1002/adma.200500734
- M. Ichikawa;
- R. Hibino;
- M. Inoue;
- T. Haritani;
- S. Hotta;
- K. Araki;
- T. Koyama;
- Y. Taniguchi
- Article
8
- Advanced Materials, 2005, v. 17, n. 17, p. 2147, doi. 10.1002/adma.200590086
- A. R. Inigo;
- C. C. Chang;
- W. Fann;
- J. D. White;
- Y.-S. Huang;
- U.-S. Jeng;
- H. S. Sheu;
- K.-Y. Peng;
- S.-A. Chen
- Article
9
- Advanced Materials, 2005, v. 17, n. 17, p. 2053, doi. 10.1002/adma.200500727
- X. Gong;
- S. Wang;
- D. Moses;
- G. C. Bazan;
- A. J. Heeger
- Article
10
- Advanced Materials, 2005, v. 17, n. 17, p. 2058, doi. 10.1002/adma.200500666
- Q. Li;
- J. F. Quinn;
- F. Caruso
- Article
11
- Advanced Materials, 2005, v. 17, n. 17, p. 2082, doi. 10.1002/adma.200500587
- H. Skaff;
- Y. Lin;
- R. Tangirala;
- K. Breitenkamp;
- A. Böker;
- T. P. Russell;
- T. Emrick
- Article
12
- Advanced Materials, 2005, v. 17, n. 17, p. 2127, doi. 10.1002/adma.200500579
- C. Jiang;
- H. Ko;
- V. V. Tsukruk
- Article
13
- Advanced Materials, 2005, v. 17, n. 17, p. 2103, doi. 10.1002/adma.200500546
- X. D. Wang;
- C. Neff;
- E. Graugnard;
- Y. Ding;
- J. S. King;
- L. A. Pranger;
- R. Tannenbaum;
- Z. L. Wang;
- C. J. Summers
- Article
14
- Advanced Materials, 2005, v. 17, n. 17, p. 2110, doi. 10.1002/adma.200500514
- W. Z. Wang;
- B. Poudel;
- D. Z. Wang;
- Z. F. Ren
- Article
15
- Advanced Materials, 2005, v. 17, n. 17, p. 2134
- B. Wüstenberg;
- N. R. Branda
- Article
16
- Advanced Materials, 2005, v. 17, n. 17, p. 2115, doi. 10.1002/adma.200500401
- S.-Z. Chu;
- K. Wada;
- S. Inoue;
- M. Isogai;
- A. Yasumori
- Article
17
- Advanced Materials, 2005, v. 17, n. 17, p. 2095, doi. 10.1002/adma.200500348
- E. Gomar-Nadal;
- J. Veciana;
- C. Rovira;
- D. B. Amabilino
- Article
18
- Advanced Materials, 2005, v. 17, n. 17, p. 2123, doi. 10.1002/adma.200500310
- M. Vennes;
- R. Zentel;
- M. Rössle;
- M. Stepputat;
- U. Kolb
- Article
19
- Advanced Materials, 2005, v. 17, n. 17, p. 2091, doi. 10.1002/adma.200500275
- E. Hosono;
- S. Fujihara;
- I. Honma;
- H. Zhou
- Article
20
- Advanced Materials, 2005, v. 17, n. 17, p. 2062, doi. 10.1002/adma.200500255
- H. Yabu;
- T. Higuchi;
- M. Shimomura
- Article
21
- Advanced Materials, 2005, v. 17, n. 17, p. 2086, doi. 10.1002/adma.200500161
- S. K. Prasad;
- G. G. Nair;
- G. Hegde
- Article
22
- Advanced Materials, 2005, v. 17, n. 17, p. 2131, doi. 10.1002/adma.200500063
- J. S. Shumaker-Parry;
- H. Rochholz;
- M. Kreiter
- Article
23
- Advanced Materials, 2005, v. 17, n. 17, p. 2119, doi. 10.1002/adma.200402046
- J.-H. Zeng;
- J. Su;
- Z.-H. Li;
- R.-X. Yan;
- Y.-D. Li
- Article
24
- Advanced Materials, 2005, v. 17, n. 17, p. 2066, doi. 10.1002/adma.200402004
- L. Jiang;
- H. Zhang;
- J. Zhuang;
- B. Yang;
- W. Yang;
- T. Li;
- C. Sun
- Article
25
- Advanced Materials, 2005, v. 17, n. 17, p. 2070, doi. 10.1002/adma.200401989
- A.-D. Peng;
- D.-B. Xiao;
- Y. Ma;
- W.-S. Yang;
- J.-N. Yao
- Article
26
- Advanced Materials, 2005, v. 17, n. 17, p. 2098, doi. 10.1002/adma.200401959
- R. He;
- D. Gao;
- R. Fan;
- A. I. Hochbaum;
- C. Carraro;
- R. Maboudian;
- P. Yang
- Article
27
- Advanced Materials, 2005, v. 17, n. 17, p. 2037, doi. 10.1002/adma.200401849
- Article
28
- Advanced Materials, 2005, v. 17, n. 17, p. 2077, doi. 10.1002/adma.200401739
- S. Kim;
- J. Seo;
- H. K. Jung;
- J.-J. Kim;
- S. Y. Park
- Article