Works matching IS 09359648 AND DT 2003 AND VI 15 AND IP 10
1
- Advanced Materials, 2003, v. 15, n. 10, p. 835, doi. 10.1002/adma.200304585
- H. Yan;
- Q. Huang;
- J. Cui;
- J.G.C. Veinot;
- M.M. Kern
- Article
2
- Advanced Materials, 2003, v. 15, n. 10, p. 842, doi. 10.1002/adma.200390142
- Article
3
- Advanced Materials, 2003, v. 15, n. 10, p. 838, doi. 10.1002/adma.200304430
- C.H. Liu;
- J.A. Zapien;
- Y. Yao;
- X.M. Meng;
- C.S. Lee;
- S.S. Fan;
- Y. Lifshitz
- Article
4
- Advanced Materials, 2003, v. 15, n. 10, p. 832, doi. 10.1002/adma.200304315
- Y. Zhang;
- Y. Guan;
- S. Yang;
- J. Xu
- Article
5
- Advanced Materials, 2003, v. 15, n. 10, p. 829, doi. 10.1002/adma.200304688
- M. Haupt;
- S. Miller;
- R. Glass;
- M. Arnold;
- R. Sauer;
- K. Thonke;
- M. Möller
- Article
6
- Advanced Materials, 2003, v. 15, n. 10, p. 826, doi. 10.1002/adma.200304696
- L. Catala;
- T. Gacoin;
- J.-P. Boilot;
- É. Rivière;
- C. Paulsen;
- E. Lhotel
- Article
7
- Advanced Materials, 2003, v. 15, n. 10, p. 822, doi. 10.1002/adma.200304840
- W. Zhang;
- X. Wen;
- S. Yang;
- Y. Berta
- Article
8
- Advanced Materials, 2003, v. 15, n. 10, p. 818, doi. 10.1002/adma.200304770
- Article
9
- Advanced Materials, 2003, v. 15, n. 10, p. 814, doi. 10.1002/adma.200304561
- D. Zhang;
- T. Yoshida;
- H. Minoura
- Article
10
- Advanced Materials, 2003, v. 15, n. 10, p. 795, doi. 10.1002/adma.200304568
- Article
11
- Advanced Materials, 2003, v. 15, n. 10, p. 807, doi. 10.1002/adma.200304619
- Y.-H. Niu;
- J. Huang;
- Y. Cao
- Article
12
- Advanced Materials, 2003, v. 15, n. 10, p. 804, doi. 10.1002/adma.200304507
- Article
13
- Advanced Materials, 2003, v. 15, n. 10, p. 800, doi. 10.1002/adma.200304253
- T. Piok;
- S. Gamerith;
- C. Gadermaier;
- H. Plank;
- F.P. Wenzl;
- S. Patil;
- R. Montenegro;
- T. Kietzke
- Article
14
- Advanced Materials, 2003, v. 15, n. 10, p. 797, doi. 10.1002/adma.200303996
- Article
15
- Advanced Materials, 2003, v. 15, n. 10, p. 811, doi. 10.1002/adma.200304581
- D.H. Kim;
- Z. Lin;
- H.-C. Kim;
- U. Jeong
- Article
16
- Advanced Materials, 2003, v. 15, n. 10, p. 792, doi. 10.1002/adma.200304567
- Q.-H. Yang;
- S. Bai;
- J.-L. Sauvajol
- Article
17
- Advanced Materials, 2003, v. 15, n. 10, p. 755, doi. 10.1002/adma.200390141
- Article
18
- Advanced Materials, 2003, v. 15, n. 10, p. 785, doi. 10.1002/adma.200304562
- K. Uchida;
- A. Takata;
- M. Saito;
- A. Murakami;
- S. Nakamura;
- M. Irie
- Article
19
- Advanced Materials, 2003, v. 15, n. 10, p. 780, doi. 10.1002/adma.200304701
- N.I. Kovtyukhova;
- T.E. Mallouk;
- T.S. Mayer
- Article
20
- Advanced Materials, 2003, v. 15, n. 10, p. 777, doi. 10.1002/adma.200304521
- H. Zhang;
- Z. Cui;
- Y. Wang;
- K. Zhang;
- X. Ji;
- C. Lü
- Article
21
- Advanced Materials, 2003, v. 15, n. 10, p. 763, doi. 10.1002/adma.200300007
- Article
22
- Advanced Materials, 2003, v. 15, n. 10, p. 788
- F. García-Santamaría;
- M. Ibisate;
- I. Rodríguez;
- F. Meseguer
- Article