Works matching IS 09359648 AND DT 2000 AND VI 12 AND IP 6
1
- Advanced Materials, 2000, v. 12, n. 6, p. 440, doi. 10.1002/(SICI)1521-4095(200003)12:6<440::AID-ADMA440>3.0.CO;2-#
- Jacob, K. T.;
- Jayadevan, K. P.;
- Mallya, R. M.;
- Waseda, Y.
- Article
2
- Advanced Materials, 2000, v. 12, n. 6, p. 451, doi. 10.1002/(SICI)1521-4095(200003)12:6<451::AID-ADMA451>3.0.CO;2-S
- Kang, Y. C.;
- Roh, H. S.;
- Park, S. B.
- Article
3
- Advanced Materials, 2000, v. 12, n. 6, p. 433, doi. 10.1002/(SICI)1521-4095(200003)12:6<433::AID-ADMA433>3.0.CO;2-S
- Article
4
- Advanced Materials, 2000, v. 12, n. 6, p. 444, doi. 10.1002/(SICI)1521-4095(200003)12:6<444::AID-ADMA444>3.0.CO;2-K
- Masuda, H.;
- Watanabe, M.;
- Yasui, K.;
- Tryk, D.;
- Rao, T.;
- Fujishima, A.
- Article
5
- Advanced Materials, 2000, v. 12, n. 6, p. 455, doi. 10.1002/(SICI)1521-4095(200003)12:6<455::AID-ADMA455>3.0.CO;2-C
- Chen, G.;
- Ushida, T.;
- Tateishi, T.
- Article
6
- Advanced Materials, 2000, v. 12, n. 6, p. 459, doi. 10.1002/(SICI)1521-4095(200003)12:6<459::AID-ADMA459>3.0.CO;2-X
- Article
7
- Advanced Materials, 2000, v. 12, n. 6, p. 410, doi. 10.1002/(SICI)1521-4095(200003)12:6<410::AID-ADMA410>3.0.CO;2-B
- Pokhodnya, K. I.;
- Epstein, A. J.;
- Miller, J. S.
- Article
8
- Advanced Materials, 2000, v. 12, n. 6, p. 403, doi. 10.1002/(SICI)1521-4095(200003)12:6<403::AID-ADMA403>3.0.CO;2-3
- Nakagawa, M.;
- Oh, S.-K.;
- Ichimura, K.
- Article
9
- Advanced Materials, 2000, v. 12, n. 6, p. 436, doi. 10.1002/(SICI)1521-4095(200003)12:6<436::AID-ADMA436>3.0.CO;2-G
- Deluzet, A.;
- Batail, P.;
- Misaki, Y.;
- Auban-Senzier, P.;
- Canadell, E.
- Article
10
- Advanced Materials, 2000, v. 12, n. 6, p. 407, doi. 10.1002/(SICI)1521-4095(200003)12:6<407::AID-ADMA407>3.0.CO;2-O
- Joerger, R.;
- Klaus, T.;
- Granqvist, C. G.
- Article
11
- Advanced Materials, 2000, v. 12, n. 6, p. 447, doi. 10.1002/(SICI)1521-4095(200003)12:6<447::AID-ADMA447>3.0.CO;2-8
- Krüger, J.;
- Bach, U.;
- Grätzel, M.
- Article
12
- Advanced Materials, 2000, v. 12, n. 6, p. 420, doi. 10.1002/(SICI)1521-4095(200003)12:6<420::AID-ADMA420>3.0.CO;2-7
- Muster, J.;
- Kim, G. T.;
- Krstić, V.;
- Park, J. G.;
- Park, Y. W.;
- Roth, S.;
- Burghard, M.
- Article
13
- Advanced Materials, 2000, v. 12, n. 6, p. 413, doi. 10.1002/(SICI)1521-4095(200003)12:6<413::AID-ADMA413>3.0.CO;2-#
- Article
14
- Advanced Materials, 2000, v. 12, n. 6, p. 424, doi. 10.1002/(SICI)1521-4095(200003)12:6<424::AID-ADMA424>3.0.CO;2-S
- Maoz, R.;
- Frydman, E.;
- Cohen, S. R.;
- Sagiv, J.
- Article
15
- Advanced Materials, 2000, v. 12, n. 6, p. 417, doi. 10.1002/(SICI)1521-4095(200003)12:6<417::AID-ADMA417>3.0.CO;2-K
- Mayer, C. R.;
- Cabuil, V.;
- Lalot, T.;
- Thouvenot, R.
- Article
16
- Advanced Materials, 2000, v. 12, n. 6, p. 430, doi. 10.1002/(SICI)1521-4095(200003)12:6<430::AID-ADMA430>3.0.CO;2-3
- de Juan, F.;
- Ruiz-Hitzky, E.
- Article