Works matching IS 09359648 AND DT 2000 AND VI 12 AND IP 10
1
- Advanced Materials, 2000, v. 12, n. 10, p. 763, doi. 10.1002/(SICI)1521-4095(200005)12:10<763::AID-ADMA763>3.0.CO;2-R
- Article
2
- Advanced Materials, 2000, v. 12, n. 10, p. 715, doi. 10.1002/(SICI)1521-4095(200005)12:10<715::AID-ADMA715>3.0.CO;2-2
- Baars, M. W. P. L.;
- van Boxtel, M. C. W.;
- Bastiaansen, C. W. M.;
- Broer, D. J.;
- Söntjens, S. H. M.;
- Meijer, E. W.
- Article
3
- Advanced Materials, 2000, v. 12, n. 10, p. 722, doi. 10.1002/(SICI)1521-4095(200005)12:10<722::AID-ADMA722>3.0.CO;2-A
- Subrahmanyam, S.;
- Piletsky, S. A.;
- Piletska, E. V.;
- Chen, B.;
- Day, R.;
- Turner, A. P. F.
- Article
4
- Advanced Materials, 2000, v. 12, n. 10, p. 719, doi. 10.1002/(SICI)1521-4095(200005)12:10<719::AID-ADMA719>3.0.CO;2-N
- Moradpour, A.;
- Ribault, M.;
- Auban-Senzier, P.
- Article
5
- Advanced Materials, 2000, v. 12, n. 10, p. 746, doi. 10.1002/(SICI)1521-4095(200005)12:10<746::AID-ADMA746>3.0.CO;2-N
- Choi, Y. C.;
- Kim, W. S.;
- Park, Y. S.;
- Lee, S. M.;
- Bae, D. J.;
- Lee, Y. H.;
- Park, G.-S.;
- Choi, W. B.;
- Lee, N. S.;
- Kim, J. M.
- Article
6
- Advanced Materials, 2000, v. 12, n. 10, p. 741, doi. 10.1002/(SICI)1521-4095(200005)12:10<741::AID-ADMA741>3.0.CO;2-6
- Weener, J.-W.;
- Meijer, E. W.
- Article
7
- Advanced Materials, 2000, v. 12, n. 10, p. 750, doi. 10.1002/(SICI)1521-4095(200005)12:10<750::AID-ADMA750>3.0.CO;2-6
- Ajayan, P. M.;
- Schadler, L. S.;
- Giannaris, C.;
- Rubio, A.
- Article
8
- Advanced Materials, 2000, v. 12, n. 10, p. 725, doi. 10.1002/(SICI)1521-4095(200005)12:10<725::AID-ADMA725>3.0.CO;2-Z
- Maoz, R.;
- Frydman, E.;
- Cohen, S. R.;
- Sagiv, J.
- Article
9
- Advanced Materials, 2000, v. 12, n. 10, p. 731, doi. 10.1002/(SICI)1521-4095(200005)12:10<731::AID-ADMA731>3.0.CO;2-A
- Kung, L. A.;
- Groves, J. T.;
- Ulman, N.;
- Boxer, S. G.
- Article
10
- Advanced Materials, 2000, v. 12, n. 10, p. 753, doi. 10.1002/(SICI)1521-4095(200005)12:10<753::AID-ADMA753>3.0.CO;2-V
- van Boxtel, M. C. W.;
- Janssen, R. H. C.;
- Broer, D. J.;
- Wilderbeek, H. T. A.;
- Bastiaansen, C. W. M.
- Article
11
- Advanced Materials, 2000, v. 12, n. 10, p. 757, doi. 10.1002/(SICI)1521-4095(200005)12:10<757::AID-ADMA757>3.0.CO;2-F
- Gierschner, J.;
- Lüer, L.;
- Oelkrug, D.;
- Musluoğlu, E.;
- Behnisch, B.;
- Hanack, M.
- Article
12
- Advanced Materials, 2000, v. 12, n. 10, p. 693, doi. 10.1002/(SICI)1521-4095(200005)12:10<693::AID-ADMA693>3.0.CO;2-J
- Xia, Y.;
- Gates, B.;
- Yin, Y.;
- Lu, Y.
- Article
13
- Advanced Materials, 2000, v. 12, n. 10, p. 734, doi. 10.1002/(SICI)1521-4095(200005)12:10<734::AID-ADMA734>3.0.CO;2-Z
- Callender, R. L.;
- Barron, A. R.
- Article
14
- Advanced Materials, 2000, v. 12, n. 10, p. 767, doi. 10.1002/(SICI)1521-4095(200005)12:10<767::AID-ADMA767>3.0.CO;2-B
- Kiang, Y.-H.;
- Lee, S.;
- Xu, Z.;
- Choe, W.;
- Gardner, G. B.
- Article
15
- Advanced Materials, 2000, v. 12, n. 10, p. 738, doi. 10.1002/(SICI)1521-4095(200005)12:10<738::AID-ADMA738>3.0.CO;2-J
- Article