Works matching IS 09359648 AND DT 1999 AND VI 11 AND IP 6
1
- Advanced Materials, 1999, v. 11, n. 6, p. 472, doi. 10.1002/(SICI)1521-4095(199904)11:6<472::AID-ADMA472>3.0.CO;2-Q
- Camaioni, Nadia;
- Casalbore-Miceli, Giuseppe;
- Geri, Alessandro;
- Nicoletti, Sergio
- Article
2
- Advanced Materials, 1999, v. 11, n. 6, p. 483, doi. 10.1002/(SICI)1521-4095(199904)11:6<483::AID-ADMA483>3.0.CO;2-I
- Li, An-Ping;
- Müller, Frank;
- Birner, Albert;
- Nielsch, Kornelius;
- Gösele, Ulrich
- Article
3
- Advanced Materials, 1999, v. 11, n. 6, p. 447, doi. 10.1002/(SICI)1521-4095(199904)11:6<447::AID-ADMA447>3.0.CO;2-I
- Brousseau III, Louis C.;
- Novak, James P.;
- Marinakos, Stella M.;
- Feldheim, Daniel L.
- Article
4
- Advanced Materials, 1999, v. 11, n. 6, p. 487, doi. 10.1002/(SICI)1521-4095(199904)11:6<487::AID-ADMA487>3.0.CO;2-2
- Article
5
- Advanced Materials, 1999, v. 11, n. 6, p. 469, doi. 10.1002/(SICI)1521-4095(199904)11:6<469::AID-ADMA469>3.0.CO;2-2
- Yin, Jin Song;
- Wang, Zhong L.
- Article
6
- Advanced Materials, 1999, v. 11, n. 6, p. 501, doi. 10.1002/(SICI)1521-4095(199904)11:6<501::AID-ADMA501>3.0.CO;2-H
- Lim, Kuo-Yi;
- Ripin, Daniel J.;
- Petrich, Gale S.;
- Villeneuve, Pierre R.;
- Fan, Shanhui;
- Joannopoulos, J. D.;
- Ippen, Erich P.;
- Kolodziejski, Leslie A.
- Article
7
- Advanced Materials, 1999, v. 11, n. 6, p. 435, doi. 10.1002/(SICI)1521-4095(199904)11:6<435::AID-ADMA435>3.0.CO;2-U
- He, Jin-An;
- Samuelson, Lynne;
- Li, Lian;
- Kumar, Jayant;
- Tripathy, Sukant K.
- Article
8
- Advanced Materials, 1999, v. 11, n. 6, p. 497, doi. 10.1002/(SICI)1521-4095(199904)11:6<497::AID-ADMA497>3.0.CO;2-Z
- Cho, Gyoujin;
- Lee, Jae-Suk;
- Glatzhofer, Daniel T.;
- Fung, Bing M.;
- Yuan, Wie Lei;
- O'Rear, Edgar A.
- Article
9
- Advanced Materials, 1999, v. 11, n. 6, p. 452, doi. 10.1002/(SICI)1521-4095(199904)11:6<452::AID-ADMA452>3.0.CO;2-Y
- Jen, Alex K.-Y.;
- Liu, Yunqi;
- Zheng, Lixin;
- Liu, Sen;
- Drost, Kevin J.;
- Zhang, Yue;
- Dalton, Larry R.
- Article
10
- Advanced Materials, 1999, v. 11, n. 6, p. 492, doi. 10.1002/(SICI)1521-4095(199904)11:6<492::AID-ADMA492>3.0.CO;2-I
- Xu, Bing;
- Arias, Francisco;
- Whitesides, George M.
- Article
11
- Advanced Materials, 1999, v. 11, n. 6, p. 474, doi. 10.1002/(SICI)1521-4095(199904)11:6<474::AID-ADMA474>3.0.CO;2-I
- Dag, Ömer;
- Ozin, Geoffrey A.;
- Yang, Hong;
- Reber, Christian;
- Bussière, Guillaume
- Article
12
- Advanced Materials, 1999, v. 11, n. 6, p. 449, doi. 10.1002/(SICI)1521-4095(199904)11:6<449::AID-ADMA449>3.0.CO;2-A
- Shenton, Wayne;
- Davis, Sean A.;
- Mann, Stephen
- Article
13
- Advanced Materials, 1999, v. 11, n. 6, p. 480, doi. 10.1002/(SICI)1521-4095(199904)11:6<480::AID-ADMA480>3.0.CO;2-U
- Herwig, Peter T.;
- Müllen, Klaus
- Article
14
- Advanced Materials, 1999, v. 11, n. 6, p. 462, doi. 10.1002/(SICI)1521-4095(199904)11:6<462::AID-ADMA462>3.0.CO;2-U
- Park, Sang Hyun;
- Gates, Byron;
- Xia, Younan
- Article
15
- Advanced Materials, 1999, v. 11, n. 6, p. 455, doi. 10.1002/(SICI)1521-4095(199904)11:6<455::AID-ADMA455>3.0.CO;2-M
- Wong, Chi Tak;
- Chan, Wai Kin
- Article
16
- Advanced Materials, 1999, v. 11, n. 6, p. 466, doi. 10.1002/(SICI)1521-4095(199904)11:6<466::AID-ADMA466>3.0.CO;2-E
- Gates, Byron;
- Qin, Dong;
- Xia, Younan
- Article
17
- Advanced Materials, 1999, v. 11, n. 6, p. 459, doi. 10.1002/(SICI)1521-4095(199904)11:6<459::AID-ADMA459>3.0.CO;2-6
- Ojima, Emiko;
- Fujiwara, Hideki;
- Kobayashi, Hayao
- Article
