Works matching IS 08631042 AND DT 2015 AND VI 55 AND IP 10

Results: 12

Size and Shape Controlled Semiconductor Nanocrystals Synthesized by RF-Sputtering Techniques for Electronic and Optoelectronic Applications.
Published in:
Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 714, doi. 10.1002/ctpp.201510017
By:
- Lehninger, D.;
- Beyer, J.;
- Schneider, F.;
- Pawlik, A.-S.;
- Heitmann, J.
Publication type:
Article
Contents: Contrib. Plasma Phys. 10/2015.
Published in:
2015
Publication type:
Editorial
Preface: Contrib. Plasma Phys. 10/2015.
Published in:
2015
Publication type:
Editorial
Plasma Treatment of Food.
Published in:
Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 753, doi. 10.1002/ctpp.201510013
By:
- Ehlbeck, J.;
- Schnabel, U.;
- Andrasch, M.;
- Stachowiak, J.;
- Stolz, N.;
- Fröhling, A.;
- Schlüter, O.;
- Weltmann, K.-D.
Publication type:
Article
On the Reduction of Gas-Phase Naphthalene Using Char-Particles in a Packed-Bed Atmospheric Pressure Plasma.
Published in:
Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 747, doi. 10.1002/ctpp.201510014
By:
- Hübner, M.;
- Brandenburg, R.;
- Neubauer, Y.;
- Röpcke, J.
Publication type:
Article
Energy Distribution of Secondary Particles in Ion Beam Deposition Process of Ag: Experiment, Calculation and Simulation.
Published in:
Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 737, doi. 10.1002/ctpp.201510015
By:
- Bundesmann, C.;
- Feder, R.;
- Lautenschläger, T.;
- Neumann, H.
Publication type:
Article
In Situ Monitoring Capabiities of Quantum Cascade Laser Absorption Spectroscopy in Industrial Plasma Processes.
Published in:
Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 758, doi. 10.1002/ctpp.201510016
By:
- Lang, N.;
- Macherius, U.;
- Glitsch, S.;
- Zimmermann, H.;
- Röpcke, J.;
- van Helden, J. H.
Publication type:
Article
E-H Transition in Argon/Oxygen Inductively Coupled RF Plasmas.
Published in:
Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 728, doi. 10.1002/ctpp.201510018
By:
- Wegner, Th.;
- Küllig, C.;
- Meichsner, J.
Publication type:
Article
Spectroscopic Investigations of Plasma Nitriding and Nitrocarburizing Processes Using an Active Screen: A Comparative Plasma Chemical Study of Two Reactor Types.
Published in:
Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 689, doi. 10.1002/ctpp.201510019
By:
- Hamann, S.;
- Börner, K.;
- Burlacov, I.;
- Spies, H.-J.;
- Röpcke, J.
Publication type:
Article
Cover Picture: Contrib. Plasma Phys. 10/2015.
Published in:
2015
Publication type:
Editorial
Issue Information: Contrib. Plasma Phys. 10/2015.
Published in:
2015
Publication type:
Editorial
On the Impact of Electron Temperature in Magnetron Sputtering Benchmarked with Energy Flux Measurements.
Published in:
2015
By:
- Haase, F.;
- Lundin, D.;
- Bornholdt, S.;
- Kersten, H.
Publication type:
Editorial