Works matching IS 08631042 AND DT 2015 AND VI 55 AND IP 10

Results: 12

Contents: Contrib. Plasma Phys. 10/2015.

Published in:: 2015
Publication type:: Editorial

Preface: Contrib. Plasma Phys. 10/2015.

Published in:: 2015
Publication type:: Editorial

Plasma Treatment of Food.

Published in:

Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 753, doi. 10.1002/ctpp.201510013

By:

Ehlbeck, J.;
Schnabel, U.;
Andrasch, M.;
Stachowiak, J.;
Stolz, N.;
Fröhling, A.;
Schlüter, O.;
Weltmann, K.-D.

Publication type:

Article

On the Reduction of Gas-Phase Naphthalene Using Char-Particles in a Packed-Bed Atmospheric Pressure Plasma.

Published in:

Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 747, doi. 10.1002/ctpp.201510014

By:

Hübner, M.;
Brandenburg, R.;
Neubauer, Y.;
Röpcke, J.

Publication type:

Article

Energy Distribution of Secondary Particles in Ion Beam Deposition Process of Ag: Experiment, Calculation and Simulation.

Published in:

Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 737, doi. 10.1002/ctpp.201510015

By:

Bundesmann, C.;
Feder, R.;
Lautenschläger, T.;
Neumann, H.

Publication type:

Article

In Situ Monitoring Capabiities of Quantum Cascade Laser Absorption Spectroscopy in Industrial Plasma Processes.

Published in:

Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 758, doi. 10.1002/ctpp.201510016

By:

Lang, N.;
Macherius, U.;
Glitsch, S.;
Zimmermann, H.;
Röpcke, J.;
van Helden, J. H.

Publication type:

Article

Size and Shape Controlled Semiconductor Nanocrystals Synthesized by RF-Sputtering Techniques for Electronic and Optoelectronic Applications.

Published in:

Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 714, doi. 10.1002/ctpp.201510017

By:

Lehninger, D.;
Beyer, J.;
Schneider, F.;
Pawlik, A.-S.;
Heitmann, J.

Publication type:

Article

E-H Transition in Argon/Oxygen Inductively Coupled RF Plasmas.

Published in:

Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 728, doi. 10.1002/ctpp.201510018

By:

Wegner, Th.;
Küllig, C.;
Meichsner, J.

Publication type:

Article

Spectroscopic Investigations of Plasma Nitriding and Nitrocarburizing Processes Using an Active Screen: A Comparative Plasma Chemical Study of Two Reactor Types.

Published in:

Contributions to Plasma Physics, 2015, v. 55, n. 10, p. 689, doi. 10.1002/ctpp.201510019

By:

Hamann, S.;
Börner, K.;
Burlacov, I.;
Spies, H.-J.;
Röpcke, J.

Publication type:

Article

Cover Picture: Contrib. Plasma Phys. 10/2015.

Published in:: 2015
Publication type:: Editorial

Issue Information: Contrib. Plasma Phys. 10/2015.

Published in:: 2015
Publication type:: Editorial

On the Impact of Electron Temperature in Magnetron Sputtering Benchmarked with Energy Flux Measurements.

Published in:

2015

By:

Haase, F.;
Lundin, D.;
Bornholdt, S.;
Kersten, H.

Publication type:

Editorial