Works matching IS 03615235 AND DT 2021 AND VI 50 AND IP 8


Results: 79
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    Process Optimization for Selective Area Doping of GaN by Ion Implantation.

    Published in:
    Journal of Electronic Materials, 2021, v. 50, n. 8, p. 4642, doi. 10.1007/s11664-021-08984-8
    By:
    • Ebrish, Mona A.;
    • Anderson, Travis J.;
    • Jacobs, Alan G.;
    • Gallagher, James C.;
    • Hite, Jennifer K.;
    • Mastro, Michael A.;
    • Feigelson, Boris N.;
    • Wang, Yekan;
    • Liao, Michael;
    • Goorsky, Mark;
    • Hobart, Karl D.
    Publication type:
    Article
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