Works matching IS 03615235 AND DT 2016 AND VI 45 AND IP 9


Results: 33
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    Hole Transport in Arsenic-Doped HgCdTe with x ≥ 0.5.

    Published in:
    Journal of Electronic Materials, 2016, v. 45, n. 9, p. 4686, doi. 10.1007/s11664-016-4474-9
    By:
    • Umana-Membreno, G.;
    • Kala, H.;
    • Bains, S.;
    • Akhavan, N.;
    • Antoszewski, J.;
    • Maxey, C.;
    • Faraone, L.
    Publication type:
    Article
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    Dry etched SiO Mask for HgCdTe Etching Process.

    Published in:
    Journal of Electronic Materials, 2016, v. 45, n. 9, p. 4705, doi. 10.1007/s11664-016-4479-4
    By:
    • Chen, Y.;
    • Ye, Z.;
    • Sun, C.;
    • Deng, L.;
    • Zhang, S.;
    • Xing, W.;
    • Hu, X.;
    • Ding, R.;
    • He, L.
    Publication type:
    Article
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    Analysis of Etched CdZnTe Substrates.

    Published in:
    Journal of Electronic Materials, 2016, v. 45, n. 9, p. 4502, doi. 10.1007/s11664-016-4642-y
    By:
    • Benson, J.;
    • Bubulac, L.;
    • Jaime-Vasquez, M.;
    • Lennon, C.;
    • Arias, J.;
    • Smith, P.;
    • Jacobs, R.;
    • Markunas, J.;
    • Almeida, L.;
    • Stoltz, A.;
    • Wijewarnasuriya, P.;
    • Peterson, J.;
    • Reddy, M.;
    • Jones, K.;
    • Johnson, S.;
    • Lofgreen, D.
    Publication type:
    Article
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