Works matching IS 03615235 AND DT 2007 AND VI 36 AND IP 4
Results: 44
Growth of GaN on Buffer Layers with Different Polarities by Hydride Vapor-Phase Epitaxy.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 436, doi. 10.1007/s11664-006-0086-0
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Optimization of High-Quality AIN Epitaxially Grown on (0001) Sapphire by Metal-Organic Vapor-Phase Epitaxy.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 533, doi. 10.1007/s11664-007-0099-3
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Magnetic Properties of Fe-Implanted ZnO Nanotips Grown by Metal-Organic Chemical Vapor Deposition.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 529, doi. 10.1007/s11664-007-0110-z
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Chemical Vapor Deposition of Silicon Carbide Epitaxial Films and Their Defect Characterization.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 332, doi. 10.1007/s11664-006-0084-2
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Characterization of Epitaxial Indium Nitride Interlayers for Ohmic Contacts to Silicon Carbide.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 312, doi. 10.1007/s11664-006-0083-3
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Foreword.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 267, doi. 10.1007/s11664-006-0082-4
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Optical and Magnetic Properties of ZnO:V Prepared by Ion Implantation.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 483, doi. 10.1007/s11664-006-0081-5
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Effects of Illumination on Ar<sup>+</sup>-Implanted n-Type 6H-SiC Epitaxial Layers.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 340, doi. 10.1007/s11664-006-0080-6
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Bias-Dependent Ultraviolet Photodetection by Au-Mg<sub>0.1</sub>Zn<sub>0.9</sub>O/ZnO-Ag Structure.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 524, doi. 10.1007/s11664-006-0079-z
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- Article
Role of Interface Layers and Localized States in TiAl-Based Ohmic Contacts to p-Type 4H-SiC.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 277, doi. 10.1007/s11664-006-0078-0
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Polytype Stability and Microstructural Characterization of Silicon Carbide Epitaxial Films Grown on [1120]- and [0001]-Oriented Silicon Carbide Substrates.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 285, doi. 10.1007/s11664-006-0076-2
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The Correlation of Surface Defects and Reverse Breakdown of 4H-SiC Schottky Barrier Diodes.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 272, doi. 10.1007/s11664-006-0075-3
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- Article
Maskless Lateral Epitaxial Growth of Gallium Nitride Using Dimethylhydrazine as a Nitrogen Precursor.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 403, doi. 10.1007/s11664-006-0074-4
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Compositional Study of Copper-Germanium Ohmic Contact to n-GaN.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 420, doi. 10.1007/s11664-006-0073-5
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Comparison of GaN and In<sub>0.04</sub>Ga<sub>0.96</sub> N p-Layers on the Electrical and Electroluminescence Properties of Green Light Emitting Diodes.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 426, doi. 10.1007/s11664-006-0072-6
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Investigations on Electrode-Less Wet Etching of GaN Using Continuous Ultraviolet Illumination.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 397, doi. 10.1007/s11664-006-0070-8
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Epitaxial Growth and Device Design Optimization of Full-Vertical GaN p-i-n Rectifiers.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 353, doi. 10.1007/s11664-006-0069-1
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Zinc Oxide Nanorods Grown by Arc Discharge.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 494, doi. 10.1007/s11664-006-0068-2
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Hybrid II-VI and III-V Compound Double Heterostructures and Their Properties.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 409, doi. 10.1007/s11664-006-0061-9
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Changes in Electrical Characteristics of ZnO Thin Films Due to Environmental Factors.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 442, doi. 10.1007/s11664-006-0063-7
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Photoluminescence and Electroluminescence Imaging of Carrot Defect in 4H-SiC Epitaxy.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 297, doi. 10.1007/s11664-006-0059-3
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Epitaxial Growth and Characterization of p-Type ZnO.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 457, doi. 10.1007/s11664-006-0056-6
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Evolution of Threading Dislocation Density and Stress in GaN Films Grown on (111) Si Substrates by Metalorganic Chemical Vapor Deposition.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 346, doi. 10.1007/s11664-006-0055-7
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Annealing and Measurement Temperature Dependence of W<sub>2</sub>B- and W<sub>2</sub>B<sub>2</sub>-Based Rectifying Contacts to p-GaN.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 384, doi. 10.1007/s11664-006-0054-8
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Tri-Buffer Process: A New Approach to Obtain High-Quality ZnO Epitaxial Films on Sapphire Substrates.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 452, doi. 10.1007/s11664-006-0053-9
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Surface and Interface Properties of Metal-Organic Chemical Vapor Deposition Grown a-Plane Mg<sub>x</sub>Zn<sub>1-x</sub>O (0 ≤ x ≤ 0.3) Films.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 446, doi. 10.1007/s11664-006-0052-x
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Ion Beam Analysis of Amorphous and Nanocrystalline Group III-V Nitride and ZnO Thin Films.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 472, doi. 10.1007/s11664-006-0051-y
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Nanopatterned Contacts to GaN.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 359, doi. 10.1007/s11664-006-0050-z
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Fabrication of p-Type ZnO Thin Films via DC Reactive Magnetron Sputtering by Using Na as the Dopant Source.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 498, doi. 10.1007/s11664-006-0047-7
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The Effect of Substrate Material and Postannealing on the Photoluminescence and Piezo Properties of DC-Sputtered ZnO.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 507, doi. 10.1007/s11664-006-0046-8
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The Use of Cathodoluminescence during Molecular Beam Epitaxy Growth of Gallium Nitride to Determine Substrate Temperature.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 431, doi. 10.1007/s11664-006-0045-9
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X-Ray Photoelectron Spectroscopy Characterization of Aluminum Nitride Surface Oxides: Thermal and Hydrothermal Evolution.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 414, doi. 10.1007/s11664-006-0044-x
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Identification of a Three-Site Defect in Semi-Insulating 4H-SiC.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 268, doi. 10.1007/s11664-006-0043-y
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Effect of Temperature on Structural and Morphologic Properties of ZnO Films Annealed in Ammonia Ambient.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 502, doi. 10.1007/s11664-006-0042-z
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Growth Optimization of an Electron Confining InN/GaN Quantum Well Heterostructure.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 373, doi. 10.1007/s11664-006-0041-0
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Effect of Si Co Doping on Ferromagnetic Properties of GaGdN.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 391, doi. 10.1007/s11664-006-0040-1
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Effect of Cryogenic Temperature Deposition of Various Metal Contacts on Bulk Single-Crystal n-Type ZnO.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 488, doi. 10.1007/s11664-006-0039-7
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Thermal Annealing and Propagation of Shockley Stacking Faults in 4H-SiC PiN Diodes.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 318, doi. 10.1007/s11664-006-0038-8
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Band Offsets in the Mg<sub>0.5</sub>Ca<sub>0.5</sub>O/GaN Heterostructure System.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 368, doi. 10.1007/s11664-006-0037-9
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Improved Long-Term Thermal Stability At 350°C Of TiB<sub>2</sub>-Based Ohmic Contacts On AlGaN/GaN High Electron Mobility Transistors.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 379, doi. 10.1007/s11664-006-0036-x
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Effect of Proton Irradiation on Interface State Density in Sc<sub>2</sub>O<sub>3</sub>/GaN and Sc<sub>2</sub>O<sub>3</sub>/MgO/GaN Diodes.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 519, doi. 10.1007/s11664-006-0035-y
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Ferromagnetism in Transition-Metal Doped ZnO.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 462, doi. 10.1007/s11664-006-0034-z
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Comparison of Solid-State Microwave Annealing with Conventional Furnace Annealing of Ion-Implanted SiC.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 324, doi. 10.1007/s11664-006-0032-1
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Effects of Electron Irradiation on Deep Centers in High-Purity Semi-Insulating 6H-SiC.
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- Journal of Electronic Materials, 2007, v. 36, n. 4, p. 307, doi. 10.1007/s11664-006-0031-2
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