Works matching IS 03615235 AND DT 2004 AND VI 33 AND IP 5
Results: 21
Characterization of 3C-SiC Thin Films Grown on Si Surfaces Patterned with Various Periods and Depths.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. L11, doi. 10.1007/s11664-004-0208-5
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Electro-Chemical Mechanical Polishing of Silicon Carbide.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 481, doi. 10.1007/s11664-004-0207-6
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SiC Via Holes by Laser Drilling.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 477, doi. 10.1007/s11664-004-0206-7
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The Influence of Composition and Unintentional Doping on the Two-Dimensional Electron Gas Density in AlGaN/GaN Heterostructures.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 440, doi. 10.1007/s11664-004-0199-2
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Partial Dislocations and Stacking Faults in 4H-SiC PiN Diodes.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 472, doi. 10.1007/s11664-004-0205-8
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Correlation between the Electrical Properties and the Interfacial Microstructures of TiAl-Based Ohmic Contacts to p-Type 4H-SiC.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 460, doi. 10.1007/s11664-004-0203-x
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Electrical Characteristics of a 6H-SiC Epitaxial Layer Grown by Chemical Vapor Deposition on Porous SiC Substrate.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 456, doi. 10.1007/s11664-004-0202-y
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Nondestructive Defect Characterization of SiC Substrates and Epilayers.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 450, doi. 10.1007/s11664-004-0201-z
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Mg Fluctuation in p-GaN Layers and Its Effects on InGaN/GaN Blue Light-Emitting Diodes Dependent on p-GaN Growth Temperature.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 445, doi. 10.1007/s11664-004-0200-0
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Optical and Electrical Characterization of (Ga,Mn)N/InGaN Multiquantum Well Light-Emitting Diodes.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 467, doi. 10.1007/s11664-004-0204-9
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Influence of Layer Structure on Performance of AlGaN/GaN High Electron Mobility Transistors before and after Passivation.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 436
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Lateral Schottky GaN Rectifiers Formed by Si<sup>+</sup> Ion Implantation.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 426, doi. 10.1007/s11664-004-0196-5
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Phonon-Assisted Deep Level Luminescence in Heavily Mg-Doped InGaN.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 431, doi. 10.1007/s11664-004-0197-4
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Unpassivated GaN/AlGaN/GaN Power High Electron Mobility Transistors with Dispersion Controlled by Epitaxial Layer Design.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 422, doi. 10.1007/s11664-004-0195-6
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Vanadium-Based Ohmic Contacts to n-Type Al<sub>0.6</sub>Ga<sub>0.4</sub>N.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 418, doi. 10.1007/s11664-004-0194-7
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Characterization of Multiple Carriers in GaN Using Variable Magnetic-Field Hall Measurements.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 412, doi. 10.1007/s11664-004-0193-8
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Time-Dependent Degradation of AlGaN/GaN Heterostructures Grown on Silicon Carbide.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 408, doi. 10.1007/s11664-004-0192-9
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Influence of Dual-Frequency Plasma-Enhanced Chemical-Vapor Deposition Si<sub>3</sub>N<sub>4</sub> Passivation on the Electrical Characteristics of AlGaN/GaN Heterostructure Field-Effect Transistors.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 400, doi. 10.1007/s11664-004-0191-x
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Electrical and Structural Properties of Low-Resistance Ti/AI/Re/Au Ohmic Contacts to n-type GaN.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 395, doi. 10.1007/s11664-004-0190-y
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Hydride Vapor-Phase Epitaxial GaN Thick Films for Quasi-Substrate Applications: Strain Distribution and Wafer Bending.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 389, doi. 10.1007/s11664-004-0189-4
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Optical and Electrical Properties of AIGaN Films Implanted with Mn, Co, or Cr.
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- Journal of Electronic Materials, 2004, v. 33, n. 5, p. 384, doi. 10.1007/s11664-004-0188-5
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