Works matching IS 02724324 AND DT 2025 AND VI 45 AND IP 3
1
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 829, doi. 10.1007/s11090-025-10558-z
- Carroll, Camden E.;
- Ranganathan, Rajagopalan V.;
- Voy, Ciel C.;
- Zhang, Zhili
- Article
2
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 707, doi. 10.1007/s11090-025-10556-1
- Dionmbete, Germain;
- Tarkwa, Jean-Baptiste;
- Boyom, Franck William Tatchemo;
- Nzali, Serge;
- Acayanka, Elie;
- Kamgang, Georges Youbi
- Article
3
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 753, doi. 10.1007/s11090-025-10555-2
- Khalaf, Madyan Ahmed;
- Ahmed, Baida M.;
- Al-Sharqi, Sahar A. H.
- Article
4
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 993, doi. 10.1007/s11090-025-10552-5
- Bernatskiy, A. V.;
- Draganov, I. I.;
- Dyatko, N. A.;
- Kochetov, I. V.;
- Lagunov, V. V.;
- Ochkin, V. N.
- Article
5
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 1011, doi. 10.1007/s11090-025-10551-6
- Lottin, P.;
- Coulon, J.-F.;
- Debarnot, D.
- Article
6
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 843, doi. 10.1007/s11090-025-10548-1
- Larsen, T. S.;
- Andersen, J. A.;
- Christensen, J. M.;
- Fateev, A.;
- Østberg, M.;
- Morais, E.;
- Bogaerts, A.;
- Jensen, A. D.
- Article
7
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 773, doi. 10.1007/s11090-025-10557-0
- Yu, Jie;
- Ma, Huihui;
- Ma, Wenjing;
- Wang, Kai;
- Liang, Chenxu;
- Li, Minrui;
- Lu, Quanfang
- Article
8
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 971, doi. 10.1007/s11090-025-10554-3
- Krivtsun, I. V.;
- Momot, A. I.;
- Antoniv, D. V.;
- Qin, Binhao
- Article
9
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 951, doi. 10.1007/s11090-025-10553-4
- Ishinokoshi, Koya;
- Okano, Rio;
- Tanaka, Yasunori;
- Ishijima, Tatsuo;
- Nakano, Yusuke
- Article
10
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 677, doi. 10.1007/s11090-025-10547-2
- Alomari, L.;
- Orriere, T.;
- Batiot-Dupeyrat, C.;
- Teychene, B.;
- Moreau, E.
- Article
11
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 659, doi. 10.1007/s11090-025-10546-3
- Article
12
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 795, doi. 10.1007/s11090-025-10545-4
- Pathak, Ram Mohan;
- Ananthanarasimhan, J.;
- Nandi, Sounak;
- Das, Chinmaya Ranjan;
- Rao, Lakshminarayana
- Article
13
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 1029, doi. 10.1007/s11090-025-10550-7
- Butnyakov, D. A.;
- Sorokin, I. A.;
- Kolodko, D. V.
- Article
14
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 661, doi. 10.1007/s11090-025-10549-0
- Xu, Dongxuan;
- Srivastava, Tanubhav K.;
- Bruggeman, Peter J.
- Article
15
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 919, doi. 10.1007/s11090-025-10543-6
- Hirka, Ivan;
- Jeništa, Jiří;
- Živný, Oldřich
- Article
16
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 873, doi. 10.1007/s11090-025-10538-3
- Keshavarzi, Maryam;
- Salahshoor, Mostafa;
- Najafi, Gholamhassan;
- Khoshtaghaza, Mohammad Hadi;
- Gorjian, Shiva;
- Ghomi, Hamid;
- Seyfi, Pourya
- Article
17
- Plasma Chemistry & Plasma Processing, 2025, v. 45, n. 3, p. 725, doi. 10.1007/s11090-025-10539-2
- Rana, Juie Nahushkumar;
- Mumtaz, Sohail;
- Han, Ihn;
- Choi, Eun Ha
- Article