Works in Plasma Chemistry & Plasma Processing, 2024, Vol 44, Issue 3


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    Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition.

    Published in:
    Plasma Chemistry & Plasma Processing, 2024, v. 44, n. 3, p. 1343, doi. 10.1007/s11090-024-10455-x
    By:
    • Carnide, G.;
    • Simonnet, C.;
    • Parmar, D.;
    • Zavvou, Z.;
    • Klein, H.;
    • Conan, R.;
    • Pozsgay, V.;
    • Verdier, T.;
    • Villeneuve-Faure, C.;
    • Kahn, M. L.;
    • Stafford, L.;
    • Clergereaux, R.
    Publication type:
    Article
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