Works in Plasma Chemistry & Plasma Processing, 2022, Vol 42, Issue 3
1
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 605, doi. 10.1007/s11090-022-10243-5
- Hamdan, Ahmad;
- Cha, Min Suk
- Article
2
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 619, doi. 10.1007/s11090-022-10242-6
- Pourali, Nima;
- Hessel, Volker;
- Rebrov, Evgeny V.
- Article
3
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 575, doi. 10.1007/s11090-022-10241-7
- Suenaga, Yuma;
- Kawano, Hiroaki;
- Takamatsu, Toshihiro;
- Matsumura, Yuriko;
- Ito, Norihiko;
- Iwasawa, Atsuo;
- Okino, Akitoshi
- Article
4
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 465, doi. 10.1007/s11090-022-10240-8
- Casteignau, Fanny;
- Aissou, Taki;
- Allard, Charlotte;
- Ricolleau, Christian;
- Veilleux, Jocelyn;
- Martel, Richard;
- Braidy, Nadi
- Article
5
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 561, doi. 10.1007/s11090-022-10239-1
- Pastorek, Michal;
- Suchoňová, Mária;
- Konečná, Barbora;
- Pásztor, Slavomír;
- Petrus, Jakub;
- Ivašková, Nadja;
- Celec, Peter;
- Gardlík, Roman;
- Machala, Zdenko;
- Tóthová, Ľubomíra
- Article
6
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 505, doi. 10.1007/s11090-022-10238-2
- Li, Haotian;
- Zeng, Fuping;
- Zhang, Mingxuan;
- Zhu, Kexin;
- Yao, Qiang;
- Wei, Gang;
- Ma, Guoming;
- Tang, Ju
- Article
7
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 587, doi. 10.1007/s11090-022-10237-3
- Khlyustova, A.;
- Sirotkin, N.;
- Naumova, I.;
- Tarasov, A.;
- Titov, V.
- Article
8
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 483, doi. 10.1007/s11090-022-10236-4
- Menneveux, Jérôme;
- Veilleux, Jocelyn
- Article
9
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 519, doi. 10.1007/s11090-022-10234-6
- Petrovic, Jelena;
- Savovic, Jelena;
- Rankovic, Dragan;
- Kuzmanovic, Miroslav
- Article
10
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 657, doi. 10.1007/s11090-022-10233-7
- Cejas, E.;
- Chamorro, J. C.;
- Prevosto, L.
- Article
11
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 641, doi. 10.1007/s11090-022-10232-8
- Yang, Zhifan;
- Chen, Qi;
- Li, Decai;
- Chen, Qianqian;
- Zhang, Mingming;
- Lu, Xingyu
- Article
12
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 671, doi. 10.1007/s11090-022-10231-9
- Zhu, Bin;
- Li, Xue;
- Deng, Xiao-Qing;
- Wang, Yan-Qun;
- Lu, Li-Lin
- Article
13
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 435, doi. 10.1007/s11090-022-10230-w
- Furukawa, Ryudai;
- Tanaka, Yasunori;
- Nagase, Y.;
- Nakano, Y.;
- Ishijima, T.;
- Sueyasu, S.;
- Watanabe, S.;
- Nakamura, K.
- Article
14
- Plasma Chemistry & Plasma Processing, 2022, v. 42, n. 3, p. 535, doi. 10.1007/s11090-022-10228-4
- Kosumsupamala, Kunpisit;
- Thana, Phuthidhorn;
- Palee, Nattawut;
- Lamasai, Kantamard;
- Kuensaen, Chakkrapong;
- Ngamjarurojana, Athipong;
- Yangkhamman, Pranom;
- Boonyawan, Dheerawan
- Article
