Works matching IS 0272-4324 AND VI 31 AND IP 1 AND DT 2011
1
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 41, doi. 10.1007/s11090-010-9268-x
- Schmitt, Karen;
- Dibble, Theodore
- Article
2
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 51, doi. 10.1007/s11090-010-9269-9
- Yong Yang;
- Hyoungsup Kim;
- Starikovskiy, Andrey;
- Cho, Young;
- Fridman, Alexander
- Article
3
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 139, doi. 10.1007/s11090-010-9266-z
- Twomey, B.;
- Nindrayog, A.;
- Niemi, K.;
- Graham, W.;
- Dowling, D.
- Article
4
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 91, doi. 10.1007/s11090-010-9267-y
- Meister, Johannes;
- Arnold, Thomas
- Article
5
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 189, doi. 10.1007/s11090-010-9263-2
- Bernardelli, E.;
- Belmonte, T.;
- Duday, D.;
- Frache, G.;
- Poncin-Epaillard, F.;
- No&,4#x00EB;l, C.;
- Choquet, P.;
- Migeon, H.-N.;
- Maliska, A.
- Article
6
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 205, doi. 10.1007/s11090-010-9264-1
- Bernardelli, E.;
- Belmonte, T.;
- Duday, D.;
- Frache, G.;
- Poncin-Epaillard, F.;
- Noël, C.;
- Choquet, P.;
- Migeon, H.-N.;
- Maliska, A.
- Article
7
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 67, doi. 10.1007/s11090-010-9272-1
- Liang Huang;
- Xing-wang Zhang;
- Lin Chen;
- Le-cheng Lei
- Article
8
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 127, doi. 10.1007/s11090-010-9274-z
- Hai-Xing Wang;
- Fu-Zhi Wei;
- Xian Meng;
- Xi Chen;
- Dong-Sheng Han;
- Wen Pan
- Article
9
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 1, doi. 10.1007/s11090-010-9275-y
- Hung, C.-T.;
- Chiu, Y.-M.;
- Hwang, F.-N.;
- Chiang, M.-H.;
- Wu, J.-S.;
- Wang, Y.-C.
- Article
10
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 23, doi. 10.1007/s11090-010-9265-0
- Lyulyukin, Mikhail;
- Besov, Alexey;
- Vorontsov, Alexander
- Article
11
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 233, doi. 10.1007/s11090-010-9276-x
- Sophonvachiraporn, Pannee;
- Rujiravanit, Ratana;
- Sreethawong, Thammanoon;
- Tokura, Seiichi;
- Chavadej, Sumaeth
- Article
12
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 109, doi. 10.1007/s11090-010-9270-3
- Ghiloufi, Imed;
- Girold, Christophe
- Article
13
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 217, doi. 10.1007/s11090-010-9271-2
- Debarnot, Dominique;
- Mérian, Tiphaine;
- Poncin-Epaillard, Fabienne
- Article
14
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 175, doi. 10.1007/s11090-010-9261-4
- Maechler, L.;
- Sarra-Bournet, C.;
- Chevallier, P.;
- Gherardi, N.;
- Laroche, G.
- Article
15
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 157, doi. 10.1007/s11090-010-9277-9
- Moiseev, T.;
- Chrastina, D.;
- Isella, G.
- Article
16
- Plasma Chemistry & Plasma Processing, 2011, v. 31, n. 1, p. 79, doi. 10.1007/s11090-010-9273-0
- Spencer, Laura;
- Gallimore, Alec
- Article