Works matching IS 0272-4324 AND VI 29 AND IP 5 AND DT 2009
1
- Plasma Chemistry & Plasma Processing, 2009, v. 29, n. 5, p. 399, doi. 10.1007/s11090-009-9187-x
- Qiang Wang;
- Xue-Rong Fan;
- Li Cui;
- Ping Wang;
- Jing Wu;
- Jian Chen
- Article
2
- Plasma Chemistry & Plasma Processing, 2009, v. 29, n. 5, p. 363, doi. 10.1007/s11090-009-9183-1
- Jasiński, Mariusz;
- Dors, Mirosław;
- Mizeraczyk, Jerzy
- Article
3
- Plasma Chemistry & Plasma Processing, 2009, v. 29, n. 5, p. 347, doi. 10.1007/s11090-009-9186-y
- Schmitt, Karen L.;
- Murray, D. M.;
- Dibble, Theodore S.
- Article
4
- Plasma Chemistry & Plasma Processing, 2009, v. 29, n. 5, p. 387, doi. 10.1007/s11090-009-9185-z
- Aixiang Wang;
- Jinzhang Gao;
- Li Yuan;
- Wu Yang
- Article
5
- Plasma Chemistry & Plasma Processing, 2009, v. 29, n. 5, p. 333, doi. 10.1007/s11090-009-9182-2
- Yaochun Yao;
- Yatsuda, Kazuyuki;
- Watanabe, Takayuki;
- Matsuura, Tsugio;
- Yano, Tetsuji
- Article
6
- Plasma Chemistry & Plasma Processing, 2009, v. 29, n. 5, p. 373, doi. 10.1007/s11090-009-9184-0
- Yoshida, Keiichiro;
- Yamamoto, Toshiaki;
- Kuroki, Tomoyuki;
- Okubo, Masaaki
- Article