Works in Chemical Engineering Communications, 2008, Vol 195, Issue 9
1
- Chemical Engineering Communications, 2008, v. 195, n. 9, p. 1059, doi. 10.1080/00986440801907524
- Gutiérrez-Antonio, Claudia;
- Iglesias-Silva, GustavoA.;
- Jiménez-Gutiérrez, Arturo
- Article
2
- Chemical Engineering Communications, 2008, v. 195, n. 9, p. 1076, doi. 10.1080/00986440801907490
- Oliveira, MauroL. N.;
- Malagoni, RicardoA.;
- Fehr, Manfred;
- Franco Júnior, MoiltonR.
- Article
3
- Chemical Engineering Communications, 2008, v. 195, n. 9, p. 1085, doi. 10.1080/00986440801907268
- Bansal, Ajay;
- Wanchoo, R. K.;
- Sharma, S. K.
- Article
4
- Chemical Engineering Communications, 2008, v. 195, n. 9, p. 1107, doi. 10.1080/00986440801907110
- Shen, Jiacheng;
- Agblevor, FosterA.
- Article
5
- Chemical Engineering Communications, 2008, v. 195, n. 9, p. 1122, doi. 10.1080/00986440801943396
- Shin, HwaSung;
- Lim, HenryC.
- Article
6
- Chemical Engineering Communications, 2008, v. 195, n. 9, p. 1144, doi. 10.1080/00986440801943503
- Natarajan, P.;
- Velraj, R.;
- Seeniraj, R. V.
- Article
7
- Chemical Engineering Communications, 2008, v. 195, n. 9, p. 1159, doi. 10.1080/00986440801943602
- Abanades, Stéphane;
- Flamant, Gilles
- Article
8
- Chemical Engineering Communications, 2008, v. 195, n. 9, p. 1176, doi. 10.1080/00986440801943750
- Zhao, Jinsheng;
- Fu, Chonggang;
- Yang, Zhengyu
- Article