Works matching IS 0038111X AND DT 1998 AND VI 41 AND IP 7

Results: 45

Two sides of the debate on 300-mm tool costs.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 344

By:

Seligson, Daniel;
Bagley, Jim

Publication type:

Article

New literature.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 335
Publication type:: Article

Product spotlight.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 279
Publication type:: Article

Critical drying technology for deep submicron processes.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 271

By:

Wang, Justin K.;
Hu, Joseph;
Puri, Suraj

Publication type:

Article

Windows NT's foundation for equipment automation.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 261

By:

Stephens, Chris

Publication type:

Article

Deposits on semiconductor corona emitters in cleanroom and...

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 249

By:

Noll, Charles G.

Publication type:

Article

Chip scale and flip chip: Attractive solutions.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 239

By:

Burggraaf, Pieter

Publication type:

Article

`One-day install' of fab equipment.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 229

By:

Wiegler, Norbert

Publication type:

Article

Using a Web intranet for fab data distribution.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 215

By:

Helak, Zbigniew;
Buczkowski, Andrzej

Publication type:

Article

Model-based adaptive process control: A CD-control example.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 205

By:

Gurer, Emir;
Zhong, Tom;
Lewellen, John;
Reynolds, Reese

Publication type:

Article

Integration risks in 300-mm wafer fab automation.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 193

By:

Chrisos, John;
Nestel-Patt, Jeff

Publication type:

Article

NTRS critical-level lithography: Reading between the lines.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 181

By:

Rizvi, Syed A.

Publication type:

Article

Wide margin CMP for STI.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 173

By:

Withers, Brad;
Zhao, Eugene;
Krusell, Wilbur;
Jairath, Rahul;
Hosali, Sharad

Publication type:

Article

Model-based analysis for precise and accurate epitaxial...

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 161

By:

Charpenay, Sylvie;
Rosenthal, Peter;
Kneissl, Gerhart;
Hoener Gondran, Carolyn;
Huff, Howard

Publication type:

Article

Surface cleaning using energetic microcluster beams.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 149

By:

Mahoney, John F.;
Perel, Julius;
Sujo, Carl;
Anderson, James C.

Publication type:

Article

Barrier and seed layers for damascene copper metallization.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 141

By:

Chin, Barry;
Ding, Peijun;
Sun, Bingxi;
Chiang, Tony;
Angelo, Darryl;
Hashim, Imran;
Xu, Zheng;
Edelstein, Sergio;
Chen, Fusen

Publication type:

Article

Atmospheric downstream plasma--a new tool for semiconductor...

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 133

By:

Savastiouk, Sergey;
Siniaguine, Oleg;
Hammond, Martin L.

Publication type:

Article

Europe.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 40
Publication type:: Article

Wet-etch process improvements through SPC.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 119

By:

Taylor, Donald S.

Publication type:

Article

IBM advanced lithography facility: The first five years.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 101

By:

Lesoine, L. Grant;
Leavey, Jeffrey A.

Publication type:

Article

Rapid thermal processing market.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 92

By:

Salzer, John

Publication type:

Article

Asiafocus.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 86

By:

B. H.;
Lunday, Christine

Publication type:

Article

Eurofocus.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 80

By:

Dunn, Peter N.

Publication type:

Article

Cu, low-k dielectrics top MRS meeting agenda.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 66

By:

Korczynski, Ed

Publication type:

Article

Israel's Nova expands metrology line.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 62

By:

Dunn, Peter N.

Publication type:

Article

Patent briefs.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 62
Publication type:: Article

CMOS `down in the mouth.'

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 60

By:

Burggraaf, Pieter

Publication type:

Article

Chemists rewrite boron chemistry reference.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 60

By:

Burggraaf, Pieter

Publication type:

Article

New venture to commercialize EUV litho technology.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 58

By:

Dunn, Peter N.

Publication type:

Article

Outlook improving for 193-nm material.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 54

By:

Dunn, Peter N.

Publication type:

Article

`Manufacturable' 100-nm features from 248-nm lithography.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 54

By:

Burggraaf, Pieter

Publication type:

Article

Semiconductor300 attacks 300-mm challenges.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 52

By:

Dunn, Peter N.

Publication type:

Article

IBM's copper technology.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 52
Publication type:: Article

Copper ECD in beta test.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 52

By:

Dunn, Peter N.

Publication type:

Article

Tech briefs.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 48
Publication type:: Article

Novellus, others unveil integrated copper system.

Published in:

Solid State Technology, 1998, v. 41, n. 7, p. 48

By:

Korczynski, Ed

Publication type:

Article

Rest of world.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 40
Publication type:: Article

Asia/Pacific.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 40
Publication type:: Article

Japan.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 38
Publication type:: Article

ISO briefs.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 34
Publication type:: Article

Financial briefs.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 32
Publication type:: Article

World Wide Web briefs.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 28
Publication type:: Article

USA.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 26
Publication type:: Article

Worldwide highlights.

Published in:: Solid State Technology, 1998, v. 41, n. 7, p. 26
Publication type:: Article

Go to the big show! See the high flyers!

Published in:

1998

By:

Haavind, Robert

Publication type:

Editorial