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- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 897, doi. 10.1002/pen.760291402
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- Publication type:
- Article
Synthesis and characterization of positive photosensitive polyimide precursors.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 950, doi. 10.1002/pen.760291413
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- Article
Photochemical free-volume generation in poly(methyl methacrylate) photoresists.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 911, doi. 10.1002/pen.760291406
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- Article
Masthead.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. fmi, doi. 10.1002/pen.760291401
- Publication type:
- Article
Soluble and optically transparent fluorine-containing photoreactive polyimide precursors: Spectral sensitization by organic peroxide and organic dye combination.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 945, doi. 10.1002/pen.760291412
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- Article
Epoxy resins for deep UV lithography.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 907, doi. 10.1002/pen.760291405
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- Publication type:
- Article
Photochemical image enhancement for 0.5 μm g-line lithography.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 965, doi. 10.1002/pen.760291416
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- Publication type:
- Article
The chemistry of g-line photoresist processes.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 928, doi. 10.1002/pen.760291409
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- Publication type:
- Article
The mechanism of photocure of inherently photosensitive polyimides containing a benzophenone group.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 942, doi. 10.1002/pen.760291411
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- Publication type:
- Article
A new contrast enhanced lithography (cel) process using 'chinese rosin' as a binder.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 902, doi. 10.1002/pen.760291404
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- Publication type:
- Article
Novel photoresist design based on electrophilic aromatic substitution.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 960, doi. 10.1002/pen.760291415
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- Publication type:
- Article
A sub-0.5 μm bilevel lithographic process using the deep-UV electron-beam resist p(si-cms).
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 920, doi. 10.1002/pen.760291408
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- Publication type:
- Article
Poly(Aryline imides) as E-beam resist: Sensitivity and resolution.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 937, doi. 10.1002/pen.760291410
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- Publication type:
- Article
Water-Soluble contrast enhancing materials-new photobleachable dyes.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 898, doi. 10.1002/pen.760291403
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- Publication type:
- Article
New high temperature stable positive photoresists based on hydroxy polyimides and polyamides containing the hexafluoroisopropylidene (6-f) linking group.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 954, doi. 10.1002/pen.760291414
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- Publication type:
- Article
Dissolution inhibition mechanisms of naphthoquinone diazides.
- Published in:
- Polymer Engineering & Science, 1989, v. 29, n. 14, p. 916, doi. 10.1002/pen.760291407
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- Publication type:
- Article