Works matching IS 00223778 AND DT 2000 AND VI 64 AND IP 4
1
- Journal of Plasma Physics, 2000, v. 64, n. 4, p. 475, doi. 10.1017/s0022377800008813
- ALLEN, M. A.;
- ROWLANDS, G.
- Article
2
- Journal of Plasma Physics, 2000, v. 64, n. 4, p. 459, doi. 10.1017/s0022377800008801
- LERCHE, I.;
- POHL, M.;
- SCHLICKEISER, R.
- Article
3
- Journal of Plasma Physics, 2000, v. 64, n. 4, p. 445, doi. 10.1017/s002237780000876x
- SIEKS, O.;
- SPATSCHEK, K. H.
- Article
4
- Journal of Plasma Physics, 2000, v. 64, n. 4, p. 433, doi. 10.1017/s0022377800008758
- HELLBERG, M. A.;
- MACE, R. L.;
- ARMSTRONG, R. J.;
- KARLSTAD, G.
- Article
5
- Journal of Plasma Physics, 2000, v. 64, n. 4, p. 313, doi. 10.1017/s0022377800008746
- Cairns, Alan;
- Infeld, Eryk
- Article
6
- Journal of Plasma Physics, 2000, v. 64, n. 4, p. 315, doi. 10.1017/s0022377800008734
- Article
7
- Journal of Plasma Physics, 2000, v. 64, n. 4, p. 543, doi. 10.1017/s0022377800008710
- Article
8
- Journal of Plasma Physics, 2000, v. 64, n. 4, p. 353, doi. 10.1017/s0022377800008655
- STENFLO, L.;
- SHUKLA, P. K.
- Article