Works matching IS 00223778 AND DT 2000 AND VI 64 AND IP 3
1
- Journal of Plasma Physics, 2000, v. 64, n. 3, p. 205, doi. 10.1017/s002237780000862x
- Article
2
- Journal of Plasma Physics, 2000, v. 64, n. 3, p. 309, doi. 10.1017/s0022377800009405
- Article
3
- Journal of Plasma Physics, 2000, v. 64, n. 3, p. 275, doi. 10.1017/s002237780000859x
- UHM, HAN S.;
- CHOI, EUN H.;
- CHO, GUANGSUP;
- KO, JAE J.
- Article
4
- Journal of Plasma Physics, 2000, v. 64, n. 3, p. 235, doi. 10.1017/s0022377800008564
- BALLAI, I.;
- ERDÉLYI, R.;
- GOOSSENS, M.
- Article
5
- Journal of Plasma Physics, 2000, v. 64, n. 3, p. 249, doi. 10.1017/s0022377800008540
- Article
6
- Journal of Plasma Physics, 2000, v. 64, n. 3, p. 255, doi. 10.1017/s0022377800008461
- JAROENSUTASINEE, K.;
- ROWLANDS, G.
- Article