Works matching IS 00223778 AND DT 1973 AND VI 9 AND IP 3
1
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 453, doi. 10.1017/S0022377800007613
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2
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 443, doi. 10.1017/S0022377800007601
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3
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 429, doi. 10.1017/S0022377800007595
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4
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 409, doi. 10.1017/S0022377800007583
- Fukao, Shoichiro;
- Tsuda, Takao
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5
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 389, doi. 10.1017/S0022377800007571
- Article
6
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 377, doi. 10.1017/S002237780000756X
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7
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 367, doi. 10.1017/S0022377800007558
- Demetriades, Anthony;
- Doughman, Ernest L.
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8
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 349, doi. 10.1017/S0022377800007546
- Fang, Ta-Ming;
- Baum†, Howard R.
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9
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 325, doi. 10.1017/S0022377800007534
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10
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 311, doi. 10.1017/S0022377800007522
- Chen, Liu;
- Landon, A. Bruce;
- Lieberman, M. A.
- Article
11
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. 295, doi. 10.1017/S0022377800007510
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12
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. b1, doi. 10.1017/S0022377800007509
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13
- Journal of Plasma Physics, 1973, v. 9, n. 3, p. f1, doi. 10.1017/S0022377800007492
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