Works matching IS 00222461 AND DT 1999 AND VI 34 AND IP 12


Results: 35
    1
    2
    3

    SiOxNy Films deposited with SiCl4 by remote plasma enhanced CVD.

    Published in:
    Journal of Materials Science, 1999, v. 34, n. 12, p. 3007, doi. 10.1023/A:1004620409994
    By:
    • Sanchez, O.;
    • Martinez-Duart, J. M.;
    • Gomez-Sanroman, R. J.;
    • Perez-Casero, R.;
    • Aguilar, M. A.;
    • Falcony, C.;
    • Fernandez-Gutierrez, F.;
    • Hernández-Vélez, M.
    Publication type:
    Article
    4
    5
    6
    7
    8
    9
    10
    11
    12
    13
    14
    15
    16
    17
    18
    19
    20
    21
    22
    23
    24
    25
    26
    27
    28
    29

    Thermal stability of TiY membrane.

    Published in:
    Journal of Materials Science, 1999, v. 34, n. 12, p. 2789, doi. 10.1023/A:1004662730041
    By:
    • Li Shi;
    • Ning-Bew Wong;
    • Kam-Chung Tin;
    • Chi-Yuen Chung
    Publication type:
    Article
    30
    31
    32
    33
    34
    35