Works matching IS 00222461 AND DT 1997 AND VI 32 AND IP 16

Nickel and copper deposition on Al2O3 and SiC particulates by using the chemical vapour deposition–fluidized bed reactor technique.

Published in:

Journal of Materials Science, 1997, v. 32, n. 16, p. 4429, doi. 10.1023/A:1018644511672

By:

• CHIH-CHI CHEN;
• SINN-WEN CHEN

Publication type:

Article