Works matching IS 00084034 AND DT 2001 AND VI 79 AND IP 6
1
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 874, doi. 10.1002/cjce.5450790605
- de Oliveira, Samuel Conceição;
- Dechechi, Eduardo CÉSar;
- Filho, Rubens Maciel;
- Freire, José Teixeira;
- Bueno
- Article
2
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 977, doi. 10.1002/cjce.5450790616
- Pérez, Sergio;
- Thérien, Normand;
- Broadbent, Arthur Douglass
- Article
3
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 913, doi. 10.1002/cjce.5450790609
- Ferdous, Deena;
- Dalai, Ajay K.;
- Bej, Shyamal K.;
- Thring, Ronald W.
- Article
4
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 931, doi. 10.1002/cjce.5450790611
- Blais, Jean-François;
- Mercier, Guy;
- Chartier, Myriam
- Article
5
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 866, doi. 10.1002/cjce.5450790604
- Leclère, Karine;
- Briens, Cédric L.;
- Bergougnou, Maurice A.;
- Bayle, JÉRôme;
- Gauthier, Thierry;
- Guigon, Pierre
- Article
6
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 968, doi. 10.1002/cjce.5450790615
- Article
7
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 902, doi. 10.1002/cjce.5450790608
- Ramos, Raquel;
- Pina, M. Pilar;
- Menéndez, Miguel;
- Santamaría, Jesús;
- Patience, Gregory S.
- Article
8
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 995, doi. 10.1002/cjce.5450790619
- Lin, Yen-Han;
- Hill, Gordon A.
- Article
9
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 923, doi. 10.1002/cjce.5450790610
- Cho, Byoung-Uk;
- Garnier, Gil;
- Paradis, Jean;
- Perrier, Michel
- Article
10
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 1004, doi. 10.1002/cjce.5450790621
- Article
11
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 860, doi. 10.1002/cjce.5450790603
- Nigam, Krishna Deo Prasad;
- Saroha, Anil Kumar;
- Kundu, Arunabha;
- Pant, Harish Jagat
- Article
12
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 961, doi. 10.1002/cjce.5450790614
- Singh, Brajeesh K.;
- Azaiez, Jalel
- Article
13
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 891, doi. 10.1002/cjce.5450790607
- Ramos, Raquel;
- Pina, M. Pilar;
- Menéndez, Miguel;
- Santamaría, Jesús;
- Patience, Gregory S.
- Article
14
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 994, doi. 10.1002/cjce.5450790618
- Article
15
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 999, doi. 10.1002/cjce.5450790620
- Article
16
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 850, doi. 10.1002/cjce.5450790602
- Alaradi, Abdul-Alghasim;
- Rohani, Sohrab
- Article
17
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 946, doi. 10.1002/cjce.5450790613
- Schmidt, Kurt A.G.;
- Mather, Alan E.
- Article
18
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 881, doi. 10.1002/cjce.5450790606
- Ravagnani, Teresa M.K.;
- Pereira, João A.F.R.
- Article
19
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 990, doi. 10.1002/cjce.5450790617
- Stockman, Gordon E.;
- Epstein, Norman
- Article
20
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. fmi, doi. 10.1002/cjce.5450790601
- Article
21
- Canadian Journal of Chemical Engineering, 2001, v. 79, n. 6, p. 941, doi. 10.1002/cjce.5450790612
- Natarajan, Ramanathan;
- Nirdosh, Inderjit
- Article